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  • Wiley-Blackwell  (7)
  • American Institute of Physics (AIP)  (4)
  • Sage
  • American Association for the Advancement of Science (AAAS)
  • 1985-1989  (11)
  • 1
    Electronic Resource
    Electronic Resource
    [S.l.] : American Institute of Physics (AIP)
    Journal of Applied Physics 64 (1988), S. 2469-2472 
    ISSN: 1089-7550
    Source: AIP Digital Archive
    Topics: Physics
    Notes: A systematic study of EL2 midgap trap in GaAs using deep-level transient spectroscopy (DLTS) is reported for contacts having a large range of Schottky barrier height. The results show that the DLTS signal of EL2 increases as the barrier height rises from 0.62 eV and saturates for barrier height above 0.83 eV. It is found, for the first time, that for Schottky barrier height lower than 0.62 eV the EL2 signal disappears. A model for calculation of the quasi-Fermi level in the depletion region is used to explain the variation and disappearance of the EL2 signal. This model may also apply to other electron traps near midgap.
    Type of Medium: Electronic Resource
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  • 2
    Electronic Resource
    Electronic Resource
    Woodbury, NY : American Institute of Physics (AIP)
    Applied Physics Letters 54 (1989), S. 268-270 
    ISSN: 1077-3118
    Source: AIP Digital Archive
    Topics: Physics
    Notes: Fermi level movements at Pt/GaAs and Ti/GaAs interfaces have been investigated using a direct measurement of Schottky barrier heights in a bimetal Schottky structure. Using thin interfacial layers, the Schottky barrier was smoothly varied from the characteristic value of the thick metal to that of the interfacial metal. The variation of barrier height versus the inner metal thickness was found to exhibit an exponential behavior extending over a few monolayers coverage. This experiment indicates a new approach to the fundamental study of metal-semiconductor interfaces and could be useful in device applications.
    Type of Medium: Electronic Resource
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  • 3
    Electronic Resource
    Electronic Resource
    [S.l.] : American Institute of Physics (AIP)
    Review of Scientific Instruments 60 (1989), S. 2140-2143 
    ISSN: 1089-7623
    Source: AIP Digital Archive
    Topics: Physics , Electrical Engineering, Measurement and Control Technology
    Notes: This paper reviews the recent progress in the development of exposure equipment for x-ray lithography consisting of compact synchrotron radiation source, beamline, and x-ray stepper. This exposure facility is situated door by door to a CMOS-pilot line. The compact storage ring COSY, under assembly in Berlin, is described and calculations are presented, that show that relatively low accumulated current exposure times of some seconds can be expected using a highly sensitive x-ray resist. A simple, inexpensive, and highly reliable beamline has been realized to connect an x-ray stepper and a light source. Several x-ray steppers have been installed for field testing in the nearby lithography laboratory at BESSY, that are equipped with x-ray reflecting mirrors, or a scanning mask and wafer unit for full-field exposure.
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  • 4
    Electronic Resource
    Electronic Resource
    College Park, Md. : American Institute of Physics (AIP)
    The Journal of Chemical Physics 84 (1986), S. 1057-1058 
    ISSN: 1089-7690
    Source: AIP Digital Archive
    Topics: Physics , Chemistry and Pharmacology
    Type of Medium: Electronic Resource
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  • 5
    Electronic Resource
    Electronic Resource
    New York, NY [u.a.] : Wiley-Blackwell
    Journal of Applied Polymer Science 37 (1989), S. 145-166 
    ISSN: 0021-8995
    Keywords: Chemistry ; Polymer and Materials Science
    Source: Wiley InterScience Backfile Collection 1832-2000
    Topics: Chemistry and Pharmacology , Mechanical Engineering, Materials Science, Production Engineering, Mining and Metallurgy, Traffic Engineering, Precision Mechanics , Physics
    Notes: The suspension polymerization of vinyl chloride is studied in a bench-scale reactor adequately reproducing reaction conditions and resin properties of industrial relevance. The evolution of particle morphology is analyzed at different stages of conversion, and a model for particle formation is verified. The influence of viscosity of the suspension medium is analyzed in relation to molecular weight distribution and particle morphology.
    Additional Material: 21 Ill.
    Type of Medium: Electronic Resource
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  • 6
    Electronic Resource
    Electronic Resource
    Weinheim : Wiley-Blackwell
    Journal of High Resolution Chromatography 9 (1986), S. 548-554 
    ISSN: 0935-6304
    Keywords: Gas liquid chromatography (GLC) ; Fused silica capillary columns ; Alkali flame ionization detection (AFID) ; Mass spectrometry (MS) ; Quantitation in human serum ; Ethylenediamine ; Aminophylline ; Small molecular weight amines and diamines ; m-Toluoyl derivatives ; Chemistry ; Analytical Chemistry and Spectroscopy
    Source: Wiley InterScience Backfile Collection 1832-2000
    Topics: Chemistry and Pharmacology
    Notes: A specific and sensitive method for the determination of ethylenediamine in human plasma is described. The aqueous sample is treated with m-toluoyl chloride, yielding the N,N′-bis(m-toluoyl) derivative of the diamine, which is extracted into dichloromethane and quantitated after “on column” methylation by capillary gas liquid chromatography with alkali flame ionization detection. The corresponding derivative of putrescine serves as internal standard. The assay is reproducible and calibration curves are linear over the concentration range 0.05 to 10 μg · ml-1. The lower detection limit is about 10 ng · ml-1. The structures of the compounds of interest eluting from the capillary column are examined by gas liquid chromatography/mass spectrometry. The assay has been applied to the analysis of ethylenediamine in plasma following the administration of aminophylline and ethylenediamine in a cross-over study to patients with bronchopulmonary diseases. The method also proves suitable for measuring other primary and secondary amines and diamines in aqueous solutions by gas liquid chromatography.
    Additional Material: 7 Ill.
    Type of Medium: Electronic Resource
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  • 7
    Electronic Resource
    Electronic Resource
    Stamford, Conn. [u.a.] : Wiley-Blackwell
    Polymer Engineering and Science 25 (1985), S. 541-547 
    ISSN: 0032-3888
    Keywords: Chemistry ; Chemical Engineering
    Source: Wiley InterScience Backfile Collection 1832-2000
    Topics: Chemistry and Pharmacology , Mechanical Engineering, Materials Science, Production Engineering, Mining and Metallurgy, Traffic Engineering, Precision Mechanics , Physics
    Notes: The big success of the reaction injection molding (RIM) process has brought about a marked interest in reacting polymer processing. In the present work, we study the technical feasibility of a continuous process to coat metallic conductors using reacting polymers. In the envisioned system, RIM type reactants are mixed and then injected into a tubular reactor through the center of which we pass the cable to be coated. The predictions of the mathematical model developed show that a feasible process can be designed by adequate control of the heat transfer phenomena. The process needs in general, a low reactor temperature and a high cable temperature.
    Additional Material: 11 Ill.
    Type of Medium: Electronic Resource
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  • 8
    Electronic Resource
    Electronic Resource
    Weinheim : Wiley-Blackwell
    Berichte der deutschen chemischen Gesellschaft 122 (1989), S. 2209-2209 
    ISSN: 0009-2940
    Keywords: Chemistry ; Inorganic Chemistry
    Source: Wiley InterScience Backfile Collection 1832-2000
    Topics: Chemistry and Pharmacology
    Type of Medium: Electronic Resource
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  • 9
    Electronic Resource
    Electronic Resource
    New York, NY : Wiley-Blackwell
    Journal für Praktische Chemie/Chemiker-Zeitung 328 (1986), S. 459-464 
    ISSN: 0021-8383
    Keywords: Chemistry ; Organic Chemistry
    Source: Wiley InterScience Backfile Collection 1832-2000
    Topics: Chemistry and Pharmacology
    Notes: Substituted 3,4-Diamino-thieno[2,3-b]pyrroles
    Additional Material: 2 Tab.
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  • 10
    Electronic Resource
    Electronic Resource
    Weinheim : Wiley-Blackwell
    Zeitschrift für anorganische Chemie 553 (1987), S. 239-247 
    ISSN: 0044-2313
    Keywords: Chemistry ; Inorganic Chemistry
    Source: Wiley InterScience Backfile Collection 1832-2000
    Topics: Chemistry and Pharmacology
    Description / Table of Contents: Reactions of elemental Sulfur with Halogenated MethanesAt 250°C a reaction between CCl4 and sulfur forms S2Cl2 and CS2 (besides small amounts of S3Cl2 and S4Cl2). CHCl3 and sulfur above 200°C under catalytic influence of AlCl3 are forming HCl, S2Cl2, and CS2; CH2Cl2 and sulfur also are reacting (with AlCl3 or AI as catalyst) to CS2 and HCl. Only at 345°C one gets,CS2, HCl, and H2S from CH3Cl and sulfur. At 160°C forms HBR,BR2, and CS2. Aluminium is necessary for the reaction of CH2Br2 at 250°C with sulfur, forming CS2 and HBr. A mixture of products (CS2,H2S, HBr, CH3SCH3, and (CH3)3SBr) results from CH3 Br and sulfur at 250°C. CH3I and sulfur produce CS2,I2, and H2S at 145°C. The same products are formed from CH2I2 and sulfur with aluminium as catalyst at 175°C.
    Notes: CCl4 reagiert bei 250°C mit Schwefel zu S2Cl2 und CS2 (neben wenig S3Cl2 und S4Cl2). Aus CHCl3 und Schwefel bilden sich oberhalb 200°C unter AlCl3-Katalyse HCl, S2Cl2 und Cs2. CH2Cl2 und Schwefel liefern (wieder mit AlCl3 bzw. auch Al) CS2 und HCl. CH3Cl reagiert mit Schwefel erst oberhalb 345°C zu CS2, HCl und H2S. CBr4erst ab 245°C mit Schwefel zu HBR, Br2un 1 CS2 umsetzt. CH2BR2 benötigt bei 250°C wieder Aluminium als Katalysator, um mit Schwefel CS2 und HBr zu bilden. CH3Br reagiert mit Schwefel bei 250° zu einem nicht genau definierten Produktgemisch aus CS2, H2S, HBr, Ch3SCH3 und (CH3)3 SBr. Aus CHI3 und Schwefel erhält man bei 145°C CS2,i2 undH2S, ebenso wie aus CH2I2 und Schwefel, allerdings nur unter Aluminiumkatalyse bei 175°C.
    Additional Material: 2 Ill.
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