ISSN:
1089-7623
Source:
AIP Digital Archive
Topics:
Physics
,
Electrical Engineering, Measurement and Control Technology
Notes:
This paper reviews the recent progress in the development of exposure equipment for x-ray lithography consisting of compact synchrotron radiation source, beamline, and x-ray stepper. This exposure facility is situated door by door to a CMOS-pilot line. The compact storage ring COSY, under assembly in Berlin, is described and calculations are presented, that show that relatively low accumulated current exposure times of some seconds can be expected using a highly sensitive x-ray resist. A simple, inexpensive, and highly reliable beamline has been realized to connect an x-ray stepper and a light source. Several x-ray steppers have been installed for field testing in the nearby lithography laboratory at BESSY, that are equipped with x-ray reflecting mirrors, or a scanning mask and wafer unit for full-field exposure.
Type of Medium:
Electronic Resource
URL:
http://dx.doi.org/10.1063/1.1140803
