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  • 1
    Electronic Resource
    Electronic Resource
    [S.l.] : American Institute of Physics (AIP)
    Journal of Applied Physics 76 (1994), S. 3583-3588 
    ISSN: 1089-7550
    Source: AIP Digital Archive
    Topics: Physics
    Notes: We report a detailed study of electron sub-band occupancies and saturation effects in silicon delta-doped gallium arsenide samples, using Hall and Shubnikov–de Haas (SdH) measurements in conjunction with numerical modeling. This study extends previous work in two respects. First, the samples, produced by molecular beam epitaxy with a nominal delta doping density of 1×1013 cm−2, were examined over a wide range of growth temperature (395–710 °C) to allow the influence of broadening of the doping profile to be examined. Second, the numerical modeling method, based on a self-consistent solution of Poisson's and Schrödinger's equations, included directly the influence of DX-like donor levels, located at 200 meV above the conduction band edge. Excellent agreement with the individual sub-band occupancies determined by SdH was found for all samples up to a growth temperature of 605 °C, with the total silicon doping density kept constant and dopant broadening as the only adjustable parameter in the fit. Despite the evidence for inclusion of DX-like donor levels based on our modeling, all samples showed only a weak persistent photoconductivity effect. This is in contrast to uniformly doped bulk GaAs, indicating the different nature of the DX level in two and three dimensional doping. Above 605 °C it was not possible to model sub-band occupancies using a constant total doping density, showing that another deactivation mechanism such as autocompensation becomes important.
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  • 2
    Electronic Resource
    Electronic Resource
    [S.l.] : American Institute of Physics (AIP)
    Journal of Applied Physics 74 (1993), S. 6256-6260 
    ISSN: 1089-7550
    Source: AIP Digital Archive
    Topics: Physics
    Notes: Careful measurements have been made of the temperature dependence of the barrier height (φb) and the Richardson constant (A**c) for several metal/GaAs (111)B Schottky diodes using current-voltage and capacitance-voltage techniques. The metals used, aluminium, copper, and gold, were evaporated at a base pressure of 10−10 Torr, to ensure no native oxide at the interface. The values obtained for the temperature dependence of the barrier height were −(4.3±0.1)×10−4 eV K−1 for all diodes except for the Cu/GaAs (111)B diode where it was −(4.7±0.1)×10−4 eV K−1. The calculated Richardson constants were 0.51×104, 0.88×104, and 1.37×104 A m−2 K−2 for the Al, Au, and Cu GaAs (111)B diodes respectively, and 0.50×104 A m−2 K−2 for the Al/GaAs (100) comparison diode. The exactness of results between the Al/GaAs (111)B and the Al/GaAs (100) Schottky diodes is believed to indicate the formation of a thin interfacial layer of AlAs, probably formed during the metal evaporation. It was found that the semiconductor orientation had a subtle effect upon the Richardson constant compared to similar Schottky diodes fabricated on (100) GaAs. The variation in A**c indicates that the band structure of the metal plays a part in the formation of a Schottky barrier, and the similarity in the value of α indicates that the barriers are pinned relative to the same position. In comparison to the GaAs band gap variation with temperature, this appears to be pinned relative to the valence band of the semiconductor.
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  • 3
    Electronic Resource
    Electronic Resource
    [S.l.] : American Institute of Physics (AIP)
    Journal of Applied Physics 75 (1994), S. 2481-2488 
    ISSN: 1089-7550
    Source: AIP Digital Archive
    Topics: Physics
    Notes: The electrical and chemical properties of the interfaces formed at room temprature, between the surface of epitaxial n-type InyAl1−yAs(100) and a selection of metals have been studied. Highly ideal Au, Ag, Cu, and In diodes exhibiting the highest reported barriers (0.78–0.91 eV), measured by the current-voltage (I-V) technique, have been obtained by forming intimate contacts on atomically clean, lattice matched, molecular beam epitaxy grown InyAl1−yAs/InP(100). The formation of Au- and In-InyAl1−yAs interfaces has been investigated using x-ray photoemission spectroscopy, showing that in both cases the Fermi level is pinned at the surface prior to metal deposition. The deposition of both In and Au overlayers initiated the selective removal of As from the interface to segregate on the metal surface; however the presence of these metals on the semiconductor surface produced no further Fermi shift. These observations, in conjunction with the barrier heights measured by the I-V technique, are discussed in the context of currently supported models of Schottky barrier formation.
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  • 4
    Electronic Resource
    Electronic Resource
    [S.l.] : American Institute of Physics (AIP)
    Journal of Applied Physics 77 (1995), S. 3115-3120 
    ISSN: 1089-7550
    Source: AIP Digital Archive
    Topics: Physics
    Notes: Reflectance anisotropy spectroscopy was used to examine the surfaces of AlxGa1−xAs layers grown on GaAs(001) by molecular beam epitaxy, where the Al mole fraction was varied across the whole composition range x=(0.0,0.25,0.50,0.75,1.0). All surfaces were also independently characterized using reflection high-energy electron diffraction, and were found to exhibit a c(4×4) reconstruction. After initial changes in the spectra were observed on depositing very thin layers (≤20 monolayers), in the intermediate thickness range a regime was entered in which strong optical interference effects appeared. These effects are accurately accounted for using a four-media model. For thicker layers (≥8000 monolayers), interference effects were seen to diminish and spectra representative of the surfaces of bulk AlxGa1−xAs were obtained. © 1995 American Institute of Physics.
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  • 5
    Electronic Resource
    Electronic Resource
    [S.l.] : American Institute of Physics (AIP)
    Journal of Applied Physics 74 (1993), S. 1731-1735 
    ISSN: 1089-7550
    Source: AIP Digital Archive
    Topics: Physics
    Notes: Thick (∼3 μm) films of InxGa1−xAs grown on GaAs(100) substrates, across the whole composition range, have been examined by transmission electron microscopy and double-crystal x-ray diffraction. The results were compared with the observed growth mode of the material determined by in situ reflection high-energy electron diffraction in the molecular beam epitaxy growth system. The quality of the material degraded noticeably for compositions up to x∼0.5 associated with an increased density of dislocations and stacking faults. In contrast, improvements in quality as x approached 1.0 were correlated with the introduction of an increasingly more regular array of edge dislocations.
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  • 6
    Electronic Resource
    Electronic Resource
    [S.l.] : American Institute of Physics (AIP)
    Journal of Applied Physics 73 (1993), S. 1187-1192 
    ISSN: 1089-7550
    Source: AIP Digital Archive
    Topics: Physics
    Notes: The final stages of strain relief in the lattice mismatched InxGa1−xAs/GaAs(100) system are addressed by the examination of the residual strain in thick films (∼3 μm), grown by molecular beam epitaxy, across the entire compositional range. These results are compared with the observed variations in both the growth mode and material quality, and related to available theories. It is found that measurements are not consistent with a degradation of material quality that is simply misfit dependent, or to an abrupt change from two-dimensional (2-D) to three-dimensional (3-D) growth in the relaxation stage. Instead, the results seem to be more consistent with a continuous change from 2-D to 3-D growth between x=0 and x=0.4 (it is wholly 3-D above x=0.4). In addition, the large residual strains observed around x=0.5 are related to the poor material quality (possibly through work hardening) at this composition, which is in turn due to problems peculiar to the growth of mismatched alloys.
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  • 7
    Electronic Resource
    Electronic Resource
    [S.l.] : American Institute of Physics (AIP)
    Journal of Applied Physics 71 (1992), S. 4908-4915 
    ISSN: 1089-7550
    Source: AIP Digital Archive
    Topics: Physics
    Notes: A series of investigations are presented which address various aspects of the growth, by molecular beam epitaxy, of n-type (Si doped) on-axis GaAs/GaAs(111)B. In situ characterization by reflection high-energy electron diffraction has identified four surface phases on the static (zero growth rate) surface, and three reconstructions which occur, depending upon the substrate temperature, during growth. The n-type doping properties of GaAs/GaAs(111)B epilayers have been compared with n-GaAs/GaAs(100) structures. Hall effect and low-temperature photoluminescence measurements have demonstrated that it is possible to dope GaAs/GaAs(111)B with Si in the 6×1014 to 1018 cm−3 range. A variable growth temperature study is also presented which examines the surface structural, electrical, optical, and surface morphological properties of n-GaAs/GaAs(111)B grown in the 400 to 650 °C temperature range. The onset of electrical conduction, and optically active material, was found to be directly related to changes in the dynamic surface structure. The variable growth temperature study also revealed a temperature regime within which it was possible to significantly improve the surface morphology of on-axis GaAs/GaAs(111)B structures whilst retaining good electrical and optical properties.
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  • 8
    Electronic Resource
    Electronic Resource
    [S.l.] : American Institute of Physics (AIP)
    Journal of Applied Physics 72 (1992), S. 631-637 
    ISSN: 1089-7550
    Source: AIP Digital Archive
    Topics: Physics
    Notes: GaAs layers with thicknesses from 1 to 8 μm were grown by molecular-beam epitaxy onto Si(100) substrates. These epitaxial layers were lightly doped with Si (ND(approximately-equal-to)2×1016 cm−3). The determination of accurate numbers for the carrier concentrations and mobilities in the GaAs is complicated by the low doping and the dimensions of the films. However, a new approach in IR spectroscopy that combines a conventional reflectance measurement from 50 to 500 cm−1 with a transmittance measurement in the very far-infrared range from 12 to 62 cm−1 is demonstrated to provide precise information on both carrier concentrations and mobilities. A comparison of the results obtained at room temperature from IR and Hall measurements reveals that the nondestructive IR technique is an easy to perform and excellent characterization tool for the Ga As layers.
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  • 9
    Electronic Resource
    Electronic Resource
    Woodbury, NY : American Institute of Physics (AIP)
    Applied Physics Letters 67 (1995), S. 383-385 
    ISSN: 1077-3118
    Source: AIP Digital Archive
    Topics: Physics
    Notes: We have investigated the atomic structure and chemical bonding present at sulfur exposed GaAs(111)B-(2×2) surfaces using both scanning tunneling microscopy (STM) and synchrotron radiation core-level photoemission. Exposure of the (2×2) surface to a molecular beam of sulfur leads to the appearance of a (1×1) low-energy electron diffraction pattern which becomes increasingly well defined as the sample is annealed. However, at no stage of the annealing process does the surface display an ordered (1×1) ideal termination. Both the photoemission data and STM images show that a large proportion of the As trimer units of the clean (2×2) surface remain after sulfur exposure and annealing to 450 °C with strong evidence of sulfur substituting for As in atomic layers below the surface. The effect of these reactions is to increase the surface band-bending from that of the clean (2×2) surface. © 1995 American Institute of Physics.
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  • 10
    ISSN: 1077-3118
    Source: AIP Digital Archive
    Topics: Physics
    Notes: We present in this study reflectance anisotropy spectra also termed reflectance difference spectra for the surfaces of thick Al(x)Ga(1−x)As (x=0.0, 0.25, 0.50, 0.75, 1.00) layers grown on GaAs(001) by molecular beam epitaxy (MBE). Layers ≥2 μm thick were grown in order to minimize the interference effects from the buried interface and to obtain spectra representative of bulk Al(x)Ga(1−x)As surfaces. All surfaces were also independently characterized using reflection high energy electron diffraction (RHEED), and found to exhibit a c(4×4) reconstruction. The reflectance anisotropy spectra were qualitatively similar to one another, but showed clear dependence of energy and magnitude upon the mole fraction x. These spectra can serve as reference for determining stochiometries in MBE growth of Al(x)Ga(1−x)As and probably should be useful for future comparison to metalorganic vapor phase epitaxy (MOVPE) Al(x)Ga(1−x)As growth. © 1995 American Institute of Physics.
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