Electronic Resource
Woodbury, NY
:
American Institute of Physics (AIP)
Applied Physics Letters
69 (1996), S. 653-655
ISSN:
1077-3118
Source:
AIP Digital Archive
Topics:
Physics
Notes:
Picosecond photoresponse of carriers in Si ion-implanted Si samples has been measured using femtosecond transient reflectivity measurement. A threshold peak implant dose of 1016 cm −2 is required to achieve picosecond carrier lifetime. At this dosage, carrier lifetimes of 0.9 and 1.4 ps are measured for the as-implanted and 400 °C annealed Si substrates, respectively. The increase in carrier lifetime upon annealing is attributed to the reduction in the concentration of trap and recombination centers. Sheet resistance also shows a strong dependence on the annealing temperature. An eightfold increase in sheet resistance is obtained for annealed samples, and a reduction in hopping conduction, manifested by the e−1/T temperature dependence, may be responsible for the increase in resistance. Further evidence of decreasing hopping conduction can be also observed from the more than two orders of magnitude in reduction of sheet resistance as the peak dosage decreases from 1016 to 1014 cm−2. © 1996 American Institute of Physics.
Type of Medium:
Electronic Resource
URL:
http://dx.doi.org/10.1063/1.117795
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