Digitale Medien
[S.l.]
:
American Institute of Physics (AIP)
Journal of Applied Physics
64 (1988), S. 3295-3297
ISSN:
1089-7550
Quelle:
AIP Digital Archive
Thema:
Physik
Notizen:
The effects of the As4/Ga flux ratio and the growth temperature on the crystalline qualities are demonstrated in the heteroepitaxy of GaAs on Si grown by molecular-beam epitaxy. To improve surface morphology, either the As4/Ga flux ratio must be optimized to 8 when grown at 560 °C or the growth temperature must be increased. In electron-beam-induced current images, a lot of complicated dark regions have been observed. The dark regions decreased and photoluminescence intensity became strong with the increase in the growth temperature.
Materialart:
Digitale Medien
URL:
http://dx.doi.org/10.1063/1.341502
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