ISSN:
1432-0630
Keywords:
61.80 Fe
;
66.30 Lw
;
79.20 Kz
Source:
Springer Online Journal Archives 1860-2000
Topics:
Mechanical Engineering, Materials Science, Production Engineering, Mining and Metallurgy, Traffic Engineering, Precision Mechanics
,
Physics
Notes:
Abstract Sputtering of the solid rare gas Ar by 0.8–3.0 keV electrons was studied experimentally and theoretically. The argon films were deposited on a quartz-crystal microbalance kept at liquid-helium temperature. The yield was determined from the mass loss during irradiation. The absolute yield shows a significant dependence on film thickness in accordance with earlier measurements on electronic sputtering of solid argon. The yield shows a maximum of about 3.0±0.4 Ar/elec. at 1.5 keV. The thickness dependence reflects the mobility of electronic excitations created by the primary electrons. The data analysis is based on a theoretical treatment for the diffusive motion of these excitations. From the thickness as well as the energy dependence of the yield we may derive a characteristic diffusion length for the excitations of 200–300 Å.
Type of Medium:
Electronic Resource
URL:
http://dx.doi.org/10.1007/BF01141597
