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Radio-frequency glow discharge ion source for high resolution mass spectrometry (1995)

Saprykin, A. I. ; Melchers, F.-G. ; Becker, J. S. ; [et al.]

Springer

Fresenius' Zeitschrift für analytische Chemie 353 (1995), S. 570-574

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ISSN: 1618-2650

Source: Springer Online Journal Archives 1860-2000

Topics: Chemistry and Pharmacology

Notes: Abstract A radio-frequency powered glow discharge ion source has been developed for a double-focusing mass spectrometer. The sputtering and ionization of conducting, semiconducting and insulating materials have been realized using a 13.56 MHz generator to supply the discharge operating potential. The glow discharge ion source operates stably at argon pressures of 0.1–1 hPa and radio frequency powers of 10–50 W. The influence of discharge parameters and gas inlet system on sputtering rates and ion signal intensities for semi-insulating gallium arsenide wafers has been investigated.

Type of Medium: Electronic Resource

URL: http://dx.doi.org/10.1007/BF00321325

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