ISSN:
1573-1979
Keywords:
CMOS
;
matching
;
micro-loading-effect
;
fluctuation
Source:
Springer Online Journal Archives 1860-2000
Topics:
Electrical Engineering, Measurement and Control Technology
Notes:
Abstract Layout has strong influence on matching properties of a circuit. Current matching models, which characterize both local random non-uniformities and global systematic non-uniformities stochastically, are not adequate for the matching analysis taking the effect of layout realization into account. In order to consider topological information of layout into matching analysis, we propose a matching model which treats the random and systematic components separately. Also, we characterize the micro-loading effect, which modulates fabricated line-width according to the local density of layout patterns, into matching analysis. With these two techniques, we can perform matching analysis of CMOS circuits taking layout information into account.
Type of Medium:
Electronic Resource
URL:
http://dx.doi.org/10.1023/A:1008386116423
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