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  • 1
    Electronic Resource
    Electronic Resource
    [S.l.] : American Institute of Physics (AIP)
    Journal of Applied Physics 74 (1993), S. 6256-6260 
    ISSN: 1089-7550
    Source: AIP Digital Archive
    Topics: Physics
    Notes: Careful measurements have been made of the temperature dependence of the barrier height (φb) and the Richardson constant (A**c) for several metal/GaAs (111)B Schottky diodes using current-voltage and capacitance-voltage techniques. The metals used, aluminium, copper, and gold, were evaporated at a base pressure of 10−10 Torr, to ensure no native oxide at the interface. The values obtained for the temperature dependence of the barrier height were −(4.3±0.1)×10−4 eV K−1 for all diodes except for the Cu/GaAs (111)B diode where it was −(4.7±0.1)×10−4 eV K−1. The calculated Richardson constants were 0.51×104, 0.88×104, and 1.37×104 A m−2 K−2 for the Al, Au, and Cu GaAs (111)B diodes respectively, and 0.50×104 A m−2 K−2 for the Al/GaAs (100) comparison diode. The exactness of results between the Al/GaAs (111)B and the Al/GaAs (100) Schottky diodes is believed to indicate the formation of a thin interfacial layer of AlAs, probably formed during the metal evaporation. It was found that the semiconductor orientation had a subtle effect upon the Richardson constant compared to similar Schottky diodes fabricated on (100) GaAs. The variation in A**c indicates that the band structure of the metal plays a part in the formation of a Schottky barrier, and the similarity in the value of α indicates that the barriers are pinned relative to the same position. In comparison to the GaAs band gap variation with temperature, this appears to be pinned relative to the valence band of the semiconductor.
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  • 2
    Electronic Resource
    Electronic Resource
    [S.l.] : American Institute of Physics (AIP)
    Journal of Applied Physics 72 (1992), S. 3198-3200 
    ISSN: 1089-7550
    Source: AIP Digital Archive
    Topics: Physics
    Notes: Results of measurements of the hole recombination process at DX centers related to group-IV (silicon) and group-VI (tellurium) donor elements in AlxGa1−xAs are presented. For the DX(Si) and DX(Te) defects the values of hole capture cross section σh=2×10−13 and σh=10−13 cm2 were found, respectively. In both cases no systematic change of σh with temperature was observed. The results show that the DX center in the ground state is negatively charged as a consequence of its negative-U two-electron character.
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  • 3
    Electronic Resource
    Electronic Resource
    [S.l.] : American Institute of Physics (AIP)
    Journal of Applied Physics 73 (1993), S. 8502-8505 
    ISSN: 1089-7550
    Source: AIP Digital Archive
    Topics: Physics
    Notes: Observation of magneto-optical transitions in a Si center δ-doped quantum well is reported. The excitons are stabilized by the application of the field. With photoluminescence excitation spectroscopy (PLE), transitions below the Fermi level are observed. At magnetic fields (approximately-greater-than)8 T broadened Landau levels can be seen. The features in the PLE spectra sharpen up significantly when the Larmor diameter becomes less than the average interimpurity spacing. The effect of the ionized donors in the well on the optical spectra is discussed.
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  • 4
    Electronic Resource
    Electronic Resource
    [S.l.] : American Institute of Physics (AIP)
    Journal of Applied Physics 68 (1990), S. 2239-2245 
    ISSN: 1089-7550
    Source: AIP Digital Archive
    Topics: Physics
    Notes: The Schottky barrier height of in situ epitaxial aluminum on AlxGa1−xAs was measured as a function of aluminum mole fraction from x=0 to x=1, using I/V, C/V and activation energy plots of current-voltage dependence on temperature. The excellent electrical properties of the molecular beam epitaxy grown AlGaAs layers, with residual deep levels concentrations of less than 1014 cm−3 combined with the in situ deposition of single-crystal epitaxial aluminum resulted in extremely high quality Schottky diodes from x=0 (GaAs) to x=1 (AlAs) with accurately exponential current-voltage characteristics over up to 10 decades and with ideality factors less than 1.03. Both the C−2−V and activation energy plots were linear and yielded barrier heights in very good agreement with the I/V ones. The near-ideal characteristics of these diodes were compared with several models of Schottky barrier formation and the dependence of the Schottky barrier height on the aluminum mole fraction was found to agree with the anion vacancy model within 10–20 meV, with a maximum deviation of 46 meV.
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  • 5
    Electronic Resource
    Electronic Resource
    [S.l.] : American Institute of Physics (AIP)
    Journal of Applied Physics 74 (1993), S. 416-425 
    ISSN: 1089-7550
    Source: AIP Digital Archive
    Topics: Physics
    Notes: The dependence on temperature and alloy composition of the Schottky barrier height of Al on AlxGa1−xAs metal-semiconductor junctions for n- and p-type substrates and 0〈x〈1 is reported. All the structures were grown by molecular beam epitaxy. The compositional dependence of the barrier heights is the same as that of the band offsets in GaAs/GaAlAs heterojunctions. The barrier height for the p-type substrates is practically independent of temperature over the whole composition range, while for the n-type substrates the temperature change of the Schottky barrier follows that of the energy gap. This observation questions validity of the class of models of the Schottky barrier formation based on the concept of a neutrality level. Such behavior can, however, be reconciled if localized defects, whose ground-state wave function is of a bonding type are the source of the Fermi-level pinning at the interface.
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  • 6
    ISSN: 1089-7550
    Source: AIP Digital Archive
    Topics: Physics
    Notes: We have determined the interface state density at each interface in a series of GaAs/AlGaAs multilayer heterostructures using capacitance-voltage profile simulation. We find that the values obtained correlate to the interface recombination velocities determined by time resolved photoluminescence and also to the strength of excitonic transitions observed in steady-state photoluminescence. The optical data therefore support the validity of our results. The results show that the interface state density follows a trend that decreases with the growth of each successive interface thereby supporting the view that the interfaces act as gettering planes for impurities during growth. In addition, the parallel application of electrical and optical techniques has allowed us to estimate the activation energy and minority carrier capture cross section of the dominant recombination centers.
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  • 7
    Electronic Resource
    Electronic Resource
    [S.l.] : American Institute of Physics (AIP)
    Journal of Applied Physics 69 (1991), S. 7142-7145 
    ISSN: 1089-7550
    Source: AIP Digital Archive
    Topics: Physics
    Notes: Measurements have been made of the Richardson constant (A**) for Al/GaAs Schottky diodes in which the aluminum is deposited epitaxially by molecular beam epitaxy. These diodes are the nearest to ideal that have yet been reported. The value of (A**) for n-type GaAs, after allowing for the temperature variation of the barrier height and for the effect of tunnelling, was found to be (0.41±0.15)×104 A m −2 K−2. This is much lower than the previously accepted value, and confirms the low value reported by Srivastava, Arora, and Guha. Since there is no possibility of an interfacial layer in our diodes, we believe the low value of A** to be an intrinsic property of the Al/GaAs interface. The value of A** for Al/p-GaAs was found to be (7.0±1.5)×104 A m−2 K−2, which is lower than the theoretical value, though the discrepancy is not so large as for n-type GaAs. Because of the uncertainty in A**, values of barrier hights obtained from C−2 vs V plots are likely to be more reliable than those deduced from I/V characteristics.
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  • 8
    Electronic Resource
    Electronic Resource
    [S.l.] : American Institute of Physics (AIP)
    Journal of Applied Physics 78 (1995), S. 2411-2422 
    ISSN: 1089-7550
    Source: AIP Digital Archive
    Topics: Physics
    Notes: A range of experimental techniques has been used to measure point defect concentrations in GaAs layers grown at low temperatures (250 °C) by molecular-beam epitaxy (LT-GaAs). The effects of doping on these concentrations has been investigated by studying samples containing shallow acceptors (Be) or shallow donors (Si) in concentrations of ∼1019 cm−3. Material grown under As-rich conditions and doped with Be was completely compensated and the simultaneous detection of As0Ga by near-band-edge infrared absorption and As+Ga by electron paramagnetic resonance confirmed that the Fermi level was near the midgap position and that compensation was partly related to AsGa defects. There was no evidence for the incorporation of VGa in this layer from positron annihilation measurements. For LT-GaAs grown under As-rich conditions and doped with Si, more than 80% of the donors were compensated and the detection of SiGa–VGa pairs by infrared localized vibrational mode (LVM) spectroscopy indicated that compensating VGa defects were at least partly responsible. The presence of vacancy defects was confirmed by positron annihilation measurements. Increasing the Si doping level suppressed the incorporation of AsGa. Exposure of the Be-doped layer to a radio-frequency hydrogen plasma, generated a LVM at 1997 cm−1 and it is proposed that this line is a stretch mode of a AsGa–H–VAs defect complex. For the Si-doped layer, two stretch modes at 1764 and 1773 cm−1 and a wag mode at 779 cm−1 relating to a H-defect complex were detected and we argue that the complex could be a passivated As antisite. The detection of characteristic hydrogen-native defect LVMs may provide a new method for the identification of intrinsic defects. © 1995 American Institute of Physics.
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  • 9
    Electronic Resource
    Electronic Resource
    [S.l.] : American Institute of Physics (AIP)
    Journal of Applied Physics 78 (1995), S. 2468-2477 
    ISSN: 1089-7550
    Source: AIP Digital Archive
    Topics: Physics
    Notes: High-resolution Laplace-transform deep level transient spectroscopy has been used to study the influence of the defect local environment on electron emission from the DX centers related to group-IV (silicon) donors in AlxGa1−xAs (0.20〈x〈0.76) and δ-doped GaAs and group-VI (tellurium) donor elements in AlxGa1−xAs (0.25〈x〈0.73) and GaAs0.35P0.65. The experimental evidence that substitutional–interstitial atom motion is responsible for DX behavior and for the associated metastability effects is presented. The atom which is subjected to this transition is for DX(Si) silicon itself, as in the spectra only one group of peaks in AlxGa1−xAs is observed, while for DX(Te) it can be either gallium or aluminum, producing two groups of peaks in AlxGa1−x As and three or four broad emission bands in GaAs0.35P0.65. The present results rule out a possibility that the DX-type defect states are formed by a donor atom in a stable substitutional position with a small lattice relaxation or with a fully symmetric large lattice relaxation effect. © 1995 American Institute of Physics.
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  • 10
    Electronic Resource
    Electronic Resource
    [S.l.] : American Institute of Physics (AIP)
    Journal of Applied Physics 75 (1994), S. 7835-7841 
    ISSN: 1089-7550
    Source: AIP Digital Archive
    Topics: Physics
    Notes: Hall-effect, near-band-edge infrared absorption, and photoluminescence measurements have been carried out on undoped and Si- and Be-doped GaAs layers grown by molecular beam epitaxy at a substrate temperature of 250 °C, under As4/Ga flux ratios varying from As-rich to stoichiometric growth conditions. Dopant concentrations at or above ∼1×1019 cm−3 appear to reduce the incorporation of excess arsenic as both antisite and interstitial defects at all flux ratios at this growth temperature, but only under stoichiometric conditions for Si doping of 1×1018 cm−3. The effect is attributed to dopant influencing the dissociation of the As4 molecule and the incorporation of excess As atoms into the crystal. Highly doped n-type material with excellent electrical and optical properties, and high electrical quality p-type material have been achieved by moving towards stoichiometric growth conditions. This is believed to be due to further reduction of formation of compensating defects, Ga vacancies in the n-type case, As antisites in the p type. A photoluminescence peak at 1.24 eV suggests the formation of SiGa−VGa pair defects in the highly Si-doped material.
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