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  • 1
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    Electrospun Polyaniline/Polyethylene Oxide Nanofiber Field Effect Transistor (2003)
    In:  CASI
    Details
    Publication Date: 2018-06-06
    Description: We report on the observation of field effect transistor (FET) behavior in electrospun camphorsulfonic acid doped polyaniline(PANi)/polyethylene oxide(PE0) nanofibers. Saturation channel currents are observed at surprisingly low source/drain voltages. The hole mobility in the depletion regime is 1.4 x 10(exp -4) sq cm/V s while the 1-D charge density (at zero gate bias) is calculated to be approximately 1 hole per 50 two-ring repeat units of polyaniline, consistent with the rather high channel conductivity (approx. 10(exp -3) S/cm). Reducing or eliminating the PEO content in the fiber is expected to enhance device parameters. Electrospinning is thus proposed as a simple method of fabricating 1-D polymer FET's.
    Keywords: Electronics and Electrical Engineering
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  • 2
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    A Statistical Analysis of Laser Ablated Ba(Sub 0.50)Sr(Sub 0.50)TiO(Sub 3)/LaAlO(Sub 3) Films for Microwave Applications (2002)
    In:  Other Sources
    Details
    Publication Date: 2019-07-18
    Description: The NASA Glenn Research Center is constructing a 616 element scanning phased array antenna using thin film Ba(sub x)Sr(sub 1-x)TiO(sub 3) based phase shifters. A critical milestone is the production of 616 identical phase shifters at 19 GHz with [asymptotically equal to]4 dB insertion loss and at least 337.5 deg phase shift with 3 percent bandwidth. It is well known that there is a direct relationship between dielectric tuning and loss due to the Kramers-Kronig relationship and that film crystallinity and strain, affected by the substrate template, play an important role. Ba(sub 0.50)Sr(sub 0.50)TiO (sub 3) films, nominally 400 nm thick, were deposited on 48 0.25 mm thick, 5 cm diameter LaAlO(sub 3) wafers. Although previous results suggested that Mn-doped films on MgO were intrinsically superior in terms of phase shift per unit loss, for this application phase shift per unit length was more important. The composition was selected as a compromise between tuning and loss for room temperature operation (e.g. crystallinity progressively degrades for Ba concentrations in excess of 30 percent). As a prelude to fabricating the array, it was necessary to process, screen, and inventory a large number of samples. Variable angle ellipsometry was used to characterize refractive index and film thickness across each wafer. Microstructural properties of the thin films were characterized using high resolution X-ray diffractometry. Finally, prototype phase shifters and resonators were patterned on each wafer and RE probed to measure tuning as a function of dc bias voltage as well as peak (0 field) permittivity and unloaded Q. The relationship among film quality and uniformity and performance is analyzed. This work presents the first statistically relevant study of film quality and microwave performance and represents a milestone towards commercialization of thin ferroelectric films for microwave applications.
    Keywords: Electronics and Electrical Engineering
    Type: Materials Issues for Tunable RF and Microwave Devices III; Apr 02, 2002 - Apr 03, 2002; San Francisco, CA; United States|Materials Research Society Symposium - Proceedings (ISSN 0272-9172); 720; p. 111-122
    Format: text
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  • 3
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    Improved Dielectric Properties of Heterostructured Ba2.5Sr0.5TiO3 Thin Film Composites for Microwave Dielectric Devices (2002)
    In:  CASI
    Details
    Publication Date: 2019-07-13
    Description: In the present work we have deposited MgO and Ba(sub 0.5)Sr(sub 0.5)TiO(sub 3)(BST50) thin layers in different sequences to make MgO:BST50 hetero-structured thin films. These films were characterized by X-ray diffraction and Rutherford backscattering technique and found to be highly (100) textured. The figure of merit {(C(sub0)-C(sub v)/(C(sub0-tandelta)} of the hetero-structured films was found to be higher as compared to pure BST50 films measured at 1 MHz frequency with electric field of 25.3 kV/cm. These films were used to make eight element coupled micro-strip phase shifter and characterized in a frequency range of 13-15 GHz. The high frequency figure of merit (kappa factor, defined as the ratio of degree of phase shift per dB loss) measured at around 14 GHz with electric field of 333 kV/cm has been markedly improved (around 64.28 deg/dB for hetero-structured film as compared to 24.65 deg /dB for pure film). Improvement in dielectric properties in a wide frequency range in the MgO:BST are believed to be due to the higher densification of the hetero-structured films.
    Keywords: Electronics and Electrical Engineering
    Type: 2002 Fall MRS Meeting; Dec 02, 2002 - Dec 06, 2002; Boston, MA; United States
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  • 4
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    Characterization of Hybrid Ferroelectric/HTS Thin Films for Tunable Microwave Components (1996)
    In:  CASI
    Details
    Publication Date: 2019-07-13
    Description: Since the discovery of High-Temperature-Superconductors (HTS) in 1986, a diversity of HTS-based microwave components has been demonstrated. Because of their low conductor losses, HTS-based components are very attractive for integration into microwave circuits for space communication systems. Recent advancements have made deposition of ferroelectric thin films onto HTS thin films possible. Due to the sensitivity of the ferroelectric's dielectric constant (epsilon(sub r)) to an externally applied electric field (E), ferroelectric/superconducting structures could be used in the fabrication of low loss, tunable microwave components. In this paper, we report on our study of Ba(0.5)Sr(0.5)TiO3/YBa2Cu3O(7-delta) and Ba(0.08)Sr(0.92)TiO3/YBa2Cu3O(7-delta) ferroelectric/superconducting thin films on lanthanum aluminate (LaAlO3) substrates. For the (Ba:Sr, 0.50:0.50) epitaxial sample, a epsilon(sub r) of 425 and a loss tangent (tan delta) of 0.040 were measured at 298 K, 1.0 MHz, and zero applied E. For the same sample, a epsilon(sub r) of 360 and tan delta of 0.036 were obtained at 77 K, 1.0 MHz, and zero applied E. Variations in epsilon(sub r) from 180 to 360 were observed over an applied E range of 0V/cm less than or equal to E less than or equal to 5.62 x 10(exp 4) V/cm with little change in tan delta. However, the range of epsilon(sub r) variation for the polycrystalline (Ba:Sr, 0.08:0.92) sample over 0V/cm less than or equal to E less than or equal to 4.00 x 10(exp 4) V/cm was only 3.6 percent while tan delta increased markedly. These results indicate that a lack of epitaxy between the ferroelectric and superconducting layers decreases tuning and increases microwave losses.
    Keywords: Electronics and Electrical Engineering
    Type: NASA-TM-112765 , NAS 1.15:112765 , E-9806 , Advances in Cryogenic Engineering; 41; 1747-1754
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  • 5
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    Thin Film Ba(x) Sr(1-x)TiO3 Coupled Microstrip Ku- and K-band Phase Shifters (1999)
    In:  CASI
    Details
    Publication Date: 2019-07-13
    Description: In this report authors found that the: (1) Best room temperature CMPS performance seen on 1% Mn-doped Ba(0.6)Sr(0.4)TiO3 annealed films on MgO: K = 74 C/dB. Phase Shift/coupled length: 1427 C/cm (2) Attempt to improve phase shifters through thicker as-deposited films stymied by declining film quality with film thickness. Annealing may alleviate this problem. (3) CMPS phase shift at Ku-band didn't experience the great rise in tunability seen in 1 MHz epsilon(sub r)(0) data. (4) While CMPS circuits may be well suited for arrays, simpler circuits like CPW would be more useful for characterizing epsilon(sub r) and tan(delta) at Ku-and K-band. (5) New substrates and designs are being tested.
    Keywords: Electronics and Electrical Engineering
    Type: Ferroelectrics Workshop; May 12, 1999 - May 14, 1999; Guanica; Puerto Rico
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  • 6
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    Materials and Device Optimization for High Power SiGe HBT Amplifiers at X-Band Frequencies (1999)
    In:  CASI
    Details
    Publication Date: 2019-07-13
    Description: The driving force behind SiGe development is the potential for high frequency and high power devices that provide comparable functionality as more expensive semiconductors such as InP and GaAs, but at a much lower cost. Additional advantages are the potential for incorporating SiGe devices onto monolithic Si chips and fabricating entire systems, such as receiver front-ends or RF power amplifiers, on a single chip. The work reported in this paper summarizes the materials and simulation aspects of a much larger project, which will eventually lead to SiGe HBT amplifiers with output powers greater than 1 W and over 35 dB gain at X-band frequencies. To achieve these goals, accurate analysis of the materials properties, especially in the base region, and highly refined amplifier design procedures must be established. In this paper we report the precision that may be obtained using optical ellipsometry to monitor the base and emitter thicknesses and Ge content of the base. We also report the extent of crystalline degradation in state-of-the-art SiGe films with high Ge contents. The objective of this work is to access the materials quality of HBT structures, and then use this data to model how various defects impact device performance, and which defects are most likely to limit high power and/or high frequency performance.
    Keywords: Electronics and Electrical Engineering
    Type: Silicon Monolithic Integrated Circuits in RF Systems; Apr 26, 2000 - Apr 28, 2000; Garmisch; Germany
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  • 7
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    Dual Input AND Gate Fabricated From a Single Channel Poly (3-Hexylthiophene) Thin Film Field Effect Transistor (2006)
    In:  CASI
    Details
    Publication Date: 2019-07-11
    Description: A regio-regular poly (3-hexylthiophene) (RRP3HT) thin film transistor having a split-gate architecture has been fabricated on a doped silicon/silicon nitride substrate and characterized. This device demonstrates AND logic functionality. The device functionality was controlled by applying either 0 or -10 V to each of the gate electrodes. When -10 V was simultaneously applied to both gates, the device was conductive (ON), while any other combination of gate voltages rendered the device resistive (OFF). The p-type carrier charge mobility was about 5x10(exp -4) per square centimeter per V-sec. The low mobility is attributed to the sharp contours of the RRP3HT film due to substrate non-planarity. A significant advantage of this architecture is that AND logic devices with multiple inputs can be fabricated using a single RRP3HT channel with multiple gates.
    Keywords: Electronics and Electrical Engineering
    Type: NASA/TM-2006-214015 , E-15215
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