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  • 1
    Electronic Resource
    Electronic Resource
    Springer
    Applied physics 63 (1996), S. 247-255 
    ISSN: 1432-0630
    Keywords: PACS: 79.20 Ds ; 81 15 Fg
    Source: Springer Online Journal Archives 1860-2000
    Topics: Mechanical Engineering, Materials Science, Production Engineering, Mining and Metallurgy, Traffic Engineering, Precision Mechanics , Physics
    Notes: Abstract. The deposition rate for laser ablated metals has been studied in a standard geometry for fluences up to 20 J/cm2. The rate for silver and nickel is a few percent of a monolayer per pulse at the laser wavelengths 532 nm and 355 nm. The rate for nickel is significantly higher than that for silver at 532 nm, whereas the rate for the two metals is similar at 355 nm. This behaviour disagrees with calculations based on the thermal properties at low intensities as well as predictions based on formation of an absorbing plasma at high intensities. The deposition rate falls strongly with increasing pressure of the ambient gases, nitrogen and argon.
    Type of Medium: Electronic Resource
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  • 2
    Electronic Resource
    Electronic Resource
    Springer
    Applied physics 63 (1996), S. 247-255 
    ISSN: 1432-0630
    Keywords: 79.20 Ds ; 81 15 Fg
    Source: Springer Online Journal Archives 1860-2000
    Topics: Mechanical Engineering, Materials Science, Production Engineering, Mining and Metallurgy, Traffic Engineering, Precision Mechanics , Physics
    Notes: Abstract The deposition rate for laser ablated metals has been studied in a standard geometry for fluences up to 20J/cm2. The rate for silver and nickel is a few percent of a monolayer per pulse at the laser wavelengths 532 nm and 355 nm. The rate for nickel is significantly higher than that for silver at 532 nm, whereas the rate for the two metals is similar at 355 nm. This behaviour disagrees with calculations based on the thermal properties at low intensities as well as predictions based on formation of an absorbing plasma at high intensities. The deposition rate falls strongly with increasing pressure of the ambient gases, nitrogen and argon.
    Type of Medium: Electronic Resource
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  • 3
    Electronic Resource
    Electronic Resource
    Springer
    Applied physics 46 (1988), S. 305-312 
    ISSN: 1432-0630
    Keywords: 61.80 Fe ; 66.30 Lw ; 79.20 Kz
    Source: Springer Online Journal Archives 1860-2000
    Topics: Mechanical Engineering, Materials Science, Production Engineering, Mining and Metallurgy, Traffic Engineering, Precision Mechanics , Physics
    Notes: Abstract Sputtering of the solid rare gas Ar by 0.8–3.0 keV electrons was studied experimentally and theoretically. The argon films were deposited on a quartz-crystal microbalance kept at liquid-helium temperature. The yield was determined from the mass loss during irradiation. The absolute yield shows a significant dependence on film thickness in accordance with earlier measurements on electronic sputtering of solid argon. The yield shows a maximum of about 3.0±0.4 Ar/elec. at 1.5 keV. The thickness dependence reflects the mobility of electronic excitations created by the primary electrons. The data analysis is based on a theoretical treatment for the diffusive motion of these excitations. From the thickness as well as the energy dependence of the yield we may derive a characteristic diffusion length for the excitations of 200–300 Å.
    Type of Medium: Electronic Resource
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