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  • 1995-1999  (79)
  • 1980-1984  (4)
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  • 1
    Electronic Resource
    Electronic Resource
    s.l. ; Stafa-Zurich, Switzerland
    Materials science forum Vol. 228-231 (July 1996), p. 445-450 
    ISSN: 1662-9752
    Source: Scientific.Net: Materials Science & Technology / Trans Tech Publications Archiv 1984-2008
    Topics: Mechanical Engineering, Materials Science, Production Engineering, Mining and Metallurgy, Traffic Engineering, Precision Mechanics
    Type of Medium: Electronic Resource
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  • 2
    ISSN: 1432-0630
    Keywords: PACS: 68.55; 61.10; 81.40.Ef
    Source: Springer Online Journal Archives 1860-2000
    Topics: Mechanical Engineering, Materials Science, Production Engineering, Mining and Metallurgy, Traffic Engineering, Precision Mechanics , Physics
    Notes: Abstract. The growth of epitaxial C60 thin films on mica(0 0 1) by thermal evaporation has been studied in detail by X-ray pole-figure measurements. The influence of the deposition rate, the substrate temperature and the film thickness on the in-plane epitaxial arrangements and the formation of twins has been investigated. It has been demonstrated that the C60 growth is determined by two independent and equivalent C60-crystal grain alignments (type-A and type-B). The nearly six-fold symmetry of the mica(0 0 1)-substrate surface offers the three-fold fcc-(1 1 1)-oriented C60-crystal grains two equivalent crystal alignments. A high deposition rate of 0.5 AÅ/s is responsible for the formation of twins at a substrate temperature of 150° C, which diminishes by a higher substrate temperature of 200° C. By a decrease of the deposition rate down to 0.08 AÅ/s the twins vanish at a film thickness of 200 nm and at the substrate temperature of 150° C. Under the same sublimation conditions, in addition to the type-A and type-B crystal orientations, the growth of the thin C60 films starts with a slight fibre texture which does not appear at a larger film thickness.
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  • 3
    Electronic Resource
    Electronic Resource
    s.l. ; Stafa-Zurich, Switzerland
    Materials science forum Vol. 248-249 (May 1997), p. 205-208 
    ISSN: 1662-9752
    Source: Scientific.Net: Materials Science & Technology / Trans Tech Publications Archiv 1984-2008
    Topics: Mechanical Engineering, Materials Science, Production Engineering, Mining and Metallurgy, Traffic Engineering, Precision Mechanics
    Type of Medium: Electronic Resource
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  • 4
    Electronic Resource
    Electronic Resource
    [S.l.] : American Institute of Physics (AIP)
    Journal of Applied Physics 78 (1995), S. 2070-2073 
    ISSN: 1089-7550
    Source: AIP Digital Archive
    Topics: Physics
    Notes: By deposition of C60 on silicon at temperatures smaller than 1000 °C the formation of thin epitaxial β-SiC films on Si was successful. This low-temperature regime can be important for the application of SiC in microelectronic devices. C60 was deposited on Si(001) and Si(111) in ultrahigh vacuum at constant deposition rates for some hours. The temperature of the Si substrates ranged between 800 and 900 °C. The thickness and the composition of the formed layers are determined by Rutherford backscattering (RBS). The thickness of the layers varied between about 50 nm and 1 μm depending on the deposition parameters. From the shape of the RBS spectra and the x-ray-diffraction (XRD) scans, only β-SiC can be identified. The aitch-theta–2aitch-theta XRD spectra show preferred orientation of β-SiC on Si(001) and Si(111), respectively. Additional XRD pole figure measurements demonstrate the heteroepitaxial growth of β-SiC on Si. The orientational relationships β-SiC(001)[110](parallel)Si(001)[110] and SiC(111)[1¯10](parallel)Si(111)[1¯10] can be extracted. The formation of growth defects (twins) can be observed. © 1995 American Institute of Physics.
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  • 5
    Electronic Resource
    Electronic Resource
    [S.l.] : American Institute of Physics (AIP)
    Journal of Applied Physics 79 (1996), S. 1907-1910 
    ISSN: 1089-7550
    Source: AIP Digital Archive
    Topics: Physics
    Notes: Very thin diamond films (thickness ∼0.1 μm) have been investigated by x-ray diffraction pole figure measurements using synchrotron radiation in order to understand the mechanism of heteroepitaxial diamond nucleation and the first steps of film growth on silicon(001) substrates. The diamond layers consist of an epitaxially aligned component with a crystallographic orientation identical to the substrate. The initial orientational spread of the grains around the perfect epitaxial orientation prior to any modification by a subsequent textured growth step has been determined. In the studied temperature range for the nucleation step the misalignment decreases slightly with increasing temperature. Besides the epitaxial crystallites their corresponding twins of first and second order have been found. The intensity distribution of the pole figures indicates that the process of twinning plays a dominating role in the initial growth stage which shows a tendency to become even more pronounced for higher substrate temperatures. © 1996 American Institute of Physics.
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  • 6
    Electronic Resource
    Electronic Resource
    [S.l.] : American Institute of Physics (AIP)
    Journal of Applied Physics 77 (1995), S. 4765-4770 
    ISSN: 1089-7550
    Source: AIP Digital Archive
    Topics: Physics
    Notes: Oriented diamond films have been grown on Si(001) and Si(111) substrates by microwave plasma chemical vapor deposition. X-ray diffractometry has been employed for pole figure measurements which have been evaluated by the component method. This technique can be applied to multiphase materials with overlapping pole figures. It decomposes the texture into components by identifying preferred directions in the pole density distribution. Thereby the textures of both diamond on Si(001) and on Si(111) have been reproduced quantitatively elucidating the heteroepitaxial orientational relationship and the occurrence of twinning. The volume fractions of both epitaxially oriented diamond crystallites and their twins of first order have been determined. It is shown that under the employed nucleation and growth conditions twinning is more pronounced for diamond on Si(111) than on Si(001). Furthermore, the fraction of randomly oriented crystallites in both textures has been determined. © 1995 American Institute of Physics.
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  • 7
    Electronic Resource
    Electronic Resource
    [S.l.] : American Institute of Physics (AIP)
    Review of Scientific Instruments 67 (1996), S. 3961-3964 
    ISSN: 1089-7623
    Source: AIP Digital Archive
    Topics: Physics , Electrical Engineering, Measurement and Control Technology
    Notes: An instrument is presented which was designed for comprehensive in-situ analysis of phase formation and transformation during the ion implantation process. An implanter end station with heatable He-cryostat as a sample holder was built. A temperature range from 4 to 1270 K is covered by the sample holder so that temperature can be varied during implantation or subsequent annealing in high vacuum. Both x-ray diffraction and four-point resistivity measurement are installed as in-situ investigation techniques. In this way a detailed study of structural changes and defect kinetics during ion bombardment is now possible. The whole instrument has been successfully tested. Examples of carbon ion implantation in titanium and iron are given. © 1996 American Institute of Physics.
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  • 8
    Electronic Resource
    Electronic Resource
    [S.l.] : American Institute of Physics (AIP)
    Review of Scientific Instruments 66 (1995), S. 1083-1085 
    ISSN: 1089-7623
    Source: AIP Digital Archive
    Topics: Physics , Electrical Engineering, Measurement and Control Technology
    Notes: Over the last decade ion-beam-assisted deposition (IBAD) has become a well-known technique for deposition of thin films because of its ability to control properties of coatings. A new IBAD system is introduced which includes a facility to illuminate samples by UV light during the deposition process in order to enhance motion of deposited atoms and interfacial reactions between substrate and coating. The IBAD system consists of two vacuum chambers, the preparation chamber and the analysis chamber, which are connected by a straight tube for sample transfer. Samples may be moved through the tube between the two chambers by a linear feedthrough. The preparation chamber includes a filamentless rf ion source, an electron-beam evaporator, and a tube with a nozzle delivering reactive gases near the sample during deposition. In addition to the ion-assisted deposition process, a technique based on photon irradiation has been employed to obtain significant improvements of structure and properties of deposited metal layers. As these films reflect a large fraction of light in the visible range, we use UV-light illumination. The samples are irradiated by UV light with a mercury arc lamp during deposition. To achieve the high degree of process automation most process parameters are controlled with a computer system. The analysis chamber includes a reverse view LEED/AES system, which is used to analyze composition and surface structure of thin the films. © 1995 American Institute of Physics.
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  • 9
    Electronic Resource
    Electronic Resource
    [S.l.] : American Institute of Physics (AIP)
    Review of Scientific Instruments 66 (1995), S. 3560-3562 
    ISSN: 1089-7623
    Source: AIP Digital Archive
    Topics: Physics , Electrical Engineering, Measurement and Control Technology
    Notes: A novel method yielding simultaneous information about location and orientation of the crystallites in a polycrystalline specimen has been developed and succesfully applied to the investigation of thin diamond films deposited on silicon. The experiment uses the parallel beam from a synchrotron radiation source and a microchannel plate as collimator in front of an image plate detector. Exposure times of only a few minutes could be realized. The spatial resolution was 0.375 mm but can easily be improved. © 1995 American Institute of Physics.
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  • 10
    Electronic Resource
    Electronic Resource
    Woodbury, NY : American Institute of Physics (AIP)
    Applied Physics Letters 71 (1997), S. 3448-3448 
    ISSN: 1077-3118
    Source: AIP Digital Archive
    Topics: Physics
    Type of Medium: Electronic Resource
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