ISSN:
1662-9752
Source:
Scientific.Net: Materials Science & Technology / Trans Tech Publications Archiv 1984-2008
Topics:
Mechanical Engineering, Materials Science, Production Engineering, Mining and Metallurgy, Traffic Engineering, Precision Mechanics
Notes:
AlN thin films have been deposited on p-(100) Si and glass substrates by pulsed bias arc ionplating at different negative substrate biases. The crystal orientation, deposition rate and mechanicalproperty of the films were investigated by X-ray diffraction, nanoindenter and UV-VISspectrophotometer. The results reveal that pulsed bias has a large influence on film preferredorientation, deposition rate and mechanical property. A preferred (110) orientation is observed in thefilm deposited at a bias of -50V. With the increase of the bias, film deposition rate decreases firstsharply then wildly; Film hardness and elastic modulus first increase, then decrease and finallyincreases. Higher value of film harness obtained at the bias of -50V and -500V relates to the (110)preferred orientation and grain refinement respectively
Type of Medium:
Electronic Resource
URL:
http://www.tib-hannover.de/fulltexts/2011/0528/02/17/transtech_doi~10.4028%252Fwww.scientific.net%252FMSF.561-565.1157.pdf
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