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  • 1
    Electronic Resource
    Electronic Resource
    s.l. : American Chemical Society
    Langmuir 1 (1985), S. 212-219 
    ISSN: 1520-5827
    Source: ACS Legacy Archives
    Topics: Chemistry and Pharmacology
    Type of Medium: Electronic Resource
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  • 2
    Electronic Resource
    Electronic Resource
    College Park, Md. : American Institute of Physics (AIP)
    The Journal of Chemical Physics 84 (1986), S. 2668-2674 
    ISSN: 1089-7690
    Source: AIP Digital Archive
    Topics: Physics , Chemistry and Pharmacology
    Notes: We have used two-photon laser-induced fluorescence to obtain quantitative measurements of the concentration of ground state O atoms in O2+CF4 rf discharges. Absolute calibration was achieved by generating a known concentration of atomic oxygen by UV laser photolysis of O2. Trace amounts of Ar were added to serve as an inert reference gas for concurrent optical emission measurements, in which the plasma-induced optical emission intensities from O* and Ar* lines were recorded. Emission line shapes were measured using a Fabry–Perot interfermoter to gain information on the mechanisms for formation of excited oxygen atoms in the plasma. Two excitation mechanisms were found to be important: (1) electron impact excitation of ground state atoms, e+O → O*+e, and (2) dissociative excitation of O2, e+O2 → O*+O+e. Evidence for both excitation mechanisms was obtained for O* (8446 A(ring)) emission, with atomic excitation being dominant, whereas dissociative excitation appeared to be the dominant mechanism for O* (7774 A(ring)) emission. Argon actinometry for the determination of ground state oxygen was directly tested. Because of the contribution from dissociative excitation, a strict proportionality, O*/Ar*∝[O]/[Ar], was not satisfied where O* (Ar*) is the intensity of an atomic oxygen (argon) emission line, and [O] ([Ar]) is the oxygen (argon) atom concentration. However, within certain limitations, the O* (8446 A(ring))/Ar* emission intensity ratio gives the right qualitative trends for the O atom concentration.
    Type of Medium: Electronic Resource
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  • 3
    Electronic Resource
    Electronic Resource
    s.l. : American Chemical Society
    The @journal of physical chemistry 〈Washington, DC〉 86 (1982), S. 760-765 
    Source: ACS Legacy Archives
    Topics: Chemistry and Pharmacology , Physics
    Type of Medium: Electronic Resource
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  • 4
    Electronic Resource
    Electronic Resource
    s.l. : American Chemical Society
    The @journal of physical chemistry 〈Washington, DC〉 87 (1983), S. 1906-1910 
    Source: ACS Legacy Archives
    Topics: Chemistry and Pharmacology , Physics
    Type of Medium: Electronic Resource
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  • 5
    ISSN: 1089-7674
    Source: AIP Digital Archive
    Topics: Physics
    Notes: The atmospheric pressure plasma jet (APPJ) [A. Schütze et al., IEEE Trans. Plasma Sci. 26, 1685 (1998)] is a nonthermal, high pressure, uniform glow plasma discharge that produces a high velocity effluent stream of highly reactive chemical species. The discharge operates on a feedstock gas (e.g., He/O2/H2O), which flows between an outer, grounded, cylindrical electrode and an inner, coaxial electrode powered at 13.56 MHz rf. While passing through the plasma, the feedgas becomes excited, dissociated or ionized by electron impact. Once the gas exits the discharge volume, ions and electrons are rapidly lost by recombination, but the fast-flowing effluent still contains neutral metastable species (e.g., O2*, He*) and radicals (e.g., O, OH). This reactive effluent has been shown to be an effective neutralizer of surrogates for anthrax spores and mustard blister agent. Unlike conventional wet decontamination methods, the plasma effluent does not cause corrosion and it does not destroy wiring, electronics, or most plastics, making it highly suitable for decontamination of sensitive equipment and interior spaces. Furthermore, the reactive species in the effluent rapidly degrade into harmless products leaving no lingering residue or harmful by-products. © 1999 American Institute of Physics.
    Type of Medium: Electronic Resource
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  • 6
    Electronic Resource
    Electronic Resource
    [S.l.] : American Institute of Physics (AIP)
    Journal of Applied Physics 89 (2001), S. 20-28 
    ISSN: 1089-7550
    Source: AIP Digital Archive
    Topics: Physics
    Notes: Discharge phenomena of a nonthermal atmospheric pressure plasma source have been studied. An atmospheric pressure plasma jet (APPJ) operates using rf power and produces a stable homogeneous discharge at atmospheric pressure. After breakdown, the APPJ operation is divided into two regimes, a "normal" operating mode when the discharge is stable and homogeneous, and a "failure" mode when the discharge converts into a filamentary arc. Current and voltage (I–V) characteristics and spatially resolved emission intensity profiles have been measured during the normal operating mode. These measurements show that the APPJ produces an alpha (α) mode rf capacitive discharge. Based upon a dimensional analysis using the observed I–V characteristics, a rough estimate is made for plasma density of 3×1011 cm−3 and an electron temperature of 2 eV. In addition, the gas temperature of 120 °C has been spectroscopically measured inside the discharge. These plasma parameters indicate that the APPJ shows promise for various materials applications as it can produce substantial amounts of reactive species and avoid thermal damages, while having the advantage of atmospheric pressure operation. © 2001 American Institute of Physics.
    Type of Medium: Electronic Resource
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  • 7
    Electronic Resource
    Electronic Resource
    [S.l.] : American Institute of Physics (AIP)
    Journal of Applied Physics 89 (2001), S. 15-19 
    ISSN: 1089-7550
    Source: AIP Digital Archive
    Topics: Physics
    Notes: Gas breakdown is studied in an atmospheric pressure rf capacitive plasma source developed for materials applications. At a rf frequency of 13.56 MHz, breakdown voltage is largely a function of the product of the pressure and the discharge gap spacing, approximating the Paschen curve. However, breakdown voltage varies substantially with rf frequency due to a change in the electron loss mechanism. A large increase in breakdown voltage is observed when argon, oxygen, or nitrogen is added to helium despite their lower ionization potential. Discussion is given for optimal breakdown conditions at atmospheric pressure. © 2001 American Institute of Physics.
    Type of Medium: Electronic Resource
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  • 8
    Electronic Resource
    Electronic Resource
    Woodbury, NY : American Institute of Physics (AIP)
    Applied Physics Letters 76 (2000), S. 288-290 
    ISSN: 1077-3118
    Source: AIP Digital Archive
    Topics: Physics
    Notes: An atmospheric pressure plasma source operated by radio frequency power has been developed. This source produces a unique discharge that is volumetric and homogeneous at atmospheric pressure with a gas temperature below 300 °C. It also produces a large quantity of oxygen atoms, ∼5×1015 cm−3, which has important value for materials applications. A theoretical model shows electron densities of 0.2–2×1011 cm−3 and characteristic electron energies of 2–4 eV for helium discharges at a power level of 3–30 W cm−3. © 2000 American Institute of Physics.
    Type of Medium: Electronic Resource
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  • 9
    Electronic Resource
    Electronic Resource
    Woodbury, NY : American Institute of Physics (AIP)
    Applied Physics Letters 52 (1988), S. 1953-1955 
    ISSN: 1077-3118
    Source: AIP Digital Archive
    Topics: Physics
    Notes: A new method, based on the photoelectric effect, is described for real-time, in situ monitoring of metal or semiconductor surfaces during plasma exposure. As an example of the application of this technique, the effect of both sputter and reactive gas plasma exposure is studied for graphite, silicon, and aluminum surfaces. Results are consistent with the formation of a surface-passivating layer of fluoride on aluminum and penetration of fluorine into the silicon bulk during exposure to the CF4+Ar etching plasma. An application of this technique for endpoint detection monitoring is described.
    Type of Medium: Electronic Resource
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  • 10
    Electronic Resource
    Electronic Resource
    Woodbury, NY : American Institute of Physics (AIP)
    Applied Physics Letters 62 (1993), S. 3207-3209 
    ISSN: 1077-3118
    Source: AIP Digital Archive
    Topics: Physics
    Notes: Results from a two-dimensional (2D) fluid simulation of a parallel plate, capacitively coupled radio frequency discharge bounded by a cylindrical insulator with a grounded exterior surface are presented. We find that the radial sheath at the insulator focuses current into the plasma region adjacent to the sheath. This 2D effect has important ramifications for the ionization rate, which peaks sharply in the metal-insulator corners. We have experimentally observed the enhancement of the emission rate in a corner using spatially resolved optical emission spectroscopy. A "thick'' insulator yields radial profiles for the time-averaged plasma density and potential that are essentially uniform. A "thin'' insulator, however, results in an off-axis maximum in the plasma density and potential due to the corner ionization.
    Type of Medium: Electronic Resource
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