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    Electronic Resource
    Springer
    Plasma chemistry and plasma processing 5 (1985), S. 183-199 
    ISSN: 1572-8986
    Keywords: Spatial resolution ; optical emission ; rf plasma ; RIE ; AlF ; CF2 ; carbon atom ; fluorocarbon
    Source: Springer Online Journal Archives 1860-2000
    Topics: Chemistry and Pharmacology , Mechanical Engineering, Materials Science, Production Engineering, Mining and Metallurgy, Traffic Engineering, Precision Mechanics , Technology
    Notes: Abstract A technique for collecting spatially resolved optical emission from large rf plasma reactors is described. To demonstrate the sensitivity and versatility of this technique, emission within the quartz ultraviolet, 225–253 nm, was studied with particular emphasis on the “plasma dark space.” Spatial variations of CF2, AlF, and C atom emission were monitored. These results have been used for discussion and evaluation of various plasma excitation and reaction mechanisms involving atomic carbon in fluorocarbon plasmas.
    Type of Medium: Electronic Resource
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