ISSN:
1573-4803
Source:
Springer Online Journal Archives 1860-2000
Topics:
Mechanical Engineering, Materials Science, Production Engineering, Mining and Metallurgy, Traffic Engineering, Precision Mechanics
Notes:
Abstract We report a study of the crystal structure and microstructure of sputtered non-stoichiometric ZnO x thin films for which 0.7 〈 x 〈 1. A substrate r.f. discharge was used to control film stoichiometry during deposition. All films had a columnar microstructure, and the film surface progressed from rough to smooth with increased oxidation. X-ray diffraction analysis detected no presence of crystalline zinc in any film. The crystallite size, strain and orientation of ZnO, detected in all films, was dependent on film composition and substrate r.f. discharge power. A model of film structure incorporating the competing effects of ion bombardment (causing amorphization) and increased oxygen content (creating improved crystallinity and orientation) is used to explain the observed variation of ZnO x crystal structure.
Type of Medium:
Electronic Resource
URL:
http://dx.doi.org/10.1007/BF01161468
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