Electronic Resource
Woodbury, NY
:
American Institute of Physics (AIP)
Applied Physics Letters
75 (1999), S. 531-533
ISSN:
1077-3118
Source:
AIP Digital Archive
Topics:
Physics
Notes:
We report the results of electrochemical etching on ZnTe crystals using the acidic etchant HNO3:HCl:H2O. Under optimized conditions we are able to etch several micrometer deep patterns into 〈111〉 and 〈110〉 surfaces. A comparison between etched and polished crystals shows that a surface enlargement of approximately 50 times can be obtained. The etched surfaces have strongly reduced optical reflectance, high photoluminescence efficiency, and excellent photosensitivity. Needlelike structures can be prepared, which exhibit a blueshift of the excitonic transition energies, indicating that parts of the etch pattern are in the quantum confinement regime. © 1999 American Institute of Physics.
Type of Medium:
Electronic Resource
URL:
http://dx.doi.org/10.1063/1.124438
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