ISSN:
0032-3888
Keywords:
Chemistry
;
Chemical Engineering
Source:
Wiley InterScience Backfile Collection 1832-2000
Topics:
Chemistry and Pharmacology
,
Mechanical Engineering, Materials Science, Production Engineering, Mining and Metallurgy, Traffic Engineering, Precision Mechanics
,
Physics
Notes:
Optimization of the deep-UV and electron-beam lithographic properties of a copolymer of trimethylsilylmethyl methacrylate (SI) and chloromethylstyrene (CMS), P(SI-CMS), within a weight average molecular weight range of 1.4 to 4.1 × 105 and 90 to 93 mole percent SI composition has been achieved. The solubility behavior of P(SI-CMS) resist was examined using the Hansen 3-dimensional solubility parameter model and dissolution rate measurements. Swelling of the resist has been minimized through the identification of a single component developer (2-propanol) and rinse (water) system. For the material containing 90 mole percent SI (14.9 weight percent Si) and M̄ω = 1.4 × 105, the sensitivity to 248 nm radiation is 65 mJ/cm2 and to electron-beam exposure is 3.4 μC/cm2 at 20 kV. This material Is applicable to bilevel lithographic processes, and the O2 reactive ion etching (RIE) rate is 16 times slower than standard hard-baked photoresist. Using a He/O2(60/40) RIE pattern transfer process, 0.4 μm line/space patterns have been resolved in a 1.3 μm bilayer structure for deep-UV exposures, and 0.25 μm imaging has been demonstrated in a 0.7 μm thick planarizing layer using electron beam irradiation. The loss in linewidth associated with the 0.25 μm process is ∼0.04 μm.
Additional Material:
13 Ill.
Type of Medium:
Electronic Resource
URL:
http://dx.doi.org/10.1002/pen.760291408
Permalink