ISSN:
1436-5073
Keywords:
Key words: Reference material; microbeam analysis; micro-lithography; beam spot size; permalloy on silicon.RID=""ID=""〈E5〉Acknowledgments.〈/E5〉 We thank S. Kuypers and R. Kemps of the Materials Department of VITO (Mol, Belgium) for taking the SEM micrographs on a JEOL JSM6340F. One of the authors (UW) is very grateful to Ms. A. Tajani of IAEA and F. Lechtenberg of Röntgen-Analytik-Service, Itzehoe, for their dedicated support in performing the XRF measurements at the IAEA Seibersdorf laboratories and at HASYLAB, respectively.
Source:
Springer Online Journal Archives 1860-2000
Topics:
Chemistry and Pharmacology
Notes:
Abstract. In order to determine the beam spot size and the linear or raster scanning properties of microprobe analytical systems, a novel reference material has been developed by IRMM, consisting of permalloy (81% Ni, 19% Fe) strip patterns of different widths on a silicon substrate. The general layout of this micro-structured reference material with pattern sizes ranging from 2 to 100 μm, fabricated with production schemes of microelectronics circuitry on silicon wafers, is discussed. The large size range of the individual pattern structures makes the material equally applicable to very fine and less focused microbeams. Due to the choice of substrate and pattern materials, these samples exhibit a high elemental contrast suitable for analysis with X-ray and electron detection and with ion scattering techniques. First chips of this material were investigated with both X-ray tube based as well as synchrotron radiation based X-ray microprobes with capillary optics. Due to the very good definition of the metal lines and their edge profiles (0.5 μm high, shape irregularities and undulations 〈 0.1 μm) line scan results of for example XRF can be directly converted to spot size and microbeam profile.
Type of Medium:
Electronic Resource
URL:
http://dx.doi.org/10.1007/s006040050053
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