ISSN:
1662-9752
Source:
Scientific.Net: Materials Science & Technology / Trans Tech Publications Archiv 1984-2008
Topics:
Mechanical Engineering, Materials Science, Production Engineering, Mining and Metallurgy, Traffic Engineering, Precision Mechanics
Notes:
Ni-Ti thin films where the R-phase transformation occurs between 55ºC and 30ºC, thepeak temperature being 40ºC, have been produced. These thin films have been grown using amagnetron assisted system of dc sputtering, with a Glow-Discharge Optical Emission Spectroscopydevice. The OES technique has been used to investigate the spatial distribution of sputtered atomsfrom the cathode to the substrate in different operating conditions: Argon pressure of 5 and 9x10 – 4Torr, without polarization and with – 60 V bias. Structural characterization of the thin films hasbeen made by XRD and the transformation temperatures associated to the shape memory effecthave been determined by DSC. A discussion of the optimization of the processing parameters(Argon pressure and polarization) is then presented
Type of Medium:
Electronic Resource
URL:
http://www.tib-hannover.de/fulltexts/2011/0528/02/12/transtech_doi~10.4028%252Fwww.scientific.net%252FMSF.514-516.1274.pdf
Permalink