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  • 1990-1994  (36)
  • 1
    Electronic Resource
    Electronic Resource
    [S.l.] : American Institute of Physics (AIP)
    Journal of Applied Physics 73 (1993), S. 4649-4659 
    ISSN: 1089-7550
    Source: AIP Digital Archive
    Topics: Physics
    Notes: The introduction of oxygen during analysis with secondary ion mass spectrometry (SIMS) is an important tool to reduce ion beam induced topography, to enhance positive ion yields, and to remove transient effects during shallow and multilayer profiling. Its main drawback, however, is that due to the tendency of some elements to segregate towards the internal SiO2/Si interface (formed by an oxygen primary beam), large profile distortions can occur. In this work, the influence of oxygen pressure on the measurement of the Pt/Si structure is investigated and its relation to the observed SIMS depth profile is established. In the low pressure regime (leading to incomplete oxidation of Si), the profile disturbances occur in the interface region and are totally the result of ionization variations. The depth at which these disturbances are seen, as well as as the magnitude of the variations, are strongly dependent on the oxygen pressure in relation to the primary current density. The latter can be explained by the competition for the Si atoms between the formation of a Pt-Si alloy and an oxide. For high pressures where Si is completely oxidized, two regimes are observed. In the first regime, when the sample still contains a large amount of Pt, a large decay length is observed, representative of the strong segregation toward the SiO2/Si interface. In a later stage, when the amount of Pt has been reduced, the decay length decreases significantly suggesting that the segregation disappears. Internal depth profiling has shown that the two decay lengths can be correlated with two different internal Pt distributions, whereby the longest decay length corresponds to a Pt accumulation in the interface region. This correlation is in agreement with theoretical predictions about the role of the internal distribution on the SIMS decay length. The work also revealed that the polarity of the detected ions has a pronounced influence on the segregation caused by field-induced migration. This segregation depended strongly on the oxidizing conditions, suggesting the formation of higher quality oxides under higher oxygen pressures.
    Type of Medium: Electronic Resource
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  • 2
    Electronic Resource
    Electronic Resource
    Woodbury, NY : American Institute of Physics (AIP)
    Applied Physics Letters 57 (1990), S. 2856-2858 
    ISSN: 1077-3118
    Source: AIP Digital Archive
    Topics: Physics
    Notes: A quantitative comparison is made of the junction depths determined by spreading resistance (SR) and secondary-ion mass spectrometry (SIMS) for submicron abrupt pn junctions (grown by molecular beam epitaxy) and Gaussian implants. The discrepancies between SR and SIMS are explained in terms of carrier spilling. From the comparison with a theoretical model, general trends can be adequately explained. In order to overcome the uncertainties imposed by the boundary conditions in this model, experimental diagrams are derived which can be used in routine analysis to assess the importance of carrier spilling effects in SR.
    Type of Medium: Electronic Resource
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  • 3
    ISSN: 1077-3118
    Source: AIP Digital Archive
    Topics: Physics
    Notes: The influence of trace metal impurities of low-temperature undoped amorphous silicon by homogeneous chemical vapor deposited a-Si:H has been explored for the first time. The metal impurities Ni, Cr, and Fe cause a shift of the transition temperature for the double-activated regime to a relatively low value. However, Ga and B impurities quench the photoluminescence intensity at a low temperature. Both of them cause weak photoemission of the films at room temperature. The shift of the transition temperature can be explained by the presence of non-radiative deep recombination centers. The quenching of the photoluminescence intensity is caused by the presence of nonradiative recombination centers.
    Type of Medium: Electronic Resource
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  • 4
    Electronic Resource
    Electronic Resource
    Woodbury, NY : American Institute of Physics (AIP)
    Applied Physics Letters 63 (1993), S. 1134-1136 
    ISSN: 1077-3118
    Source: AIP Digital Archive
    Topics: Physics
    Notes: For 30 keV B implants in Si, doses above 1.5×1014 B/cm2 will lead to dislocation formation during a subsequent 900 °C anneal to make the B electrically active. Although dislocations are avoided for doses 〈1.5×1014 B/cm2, the B concentration is only ∼1×1019 B/cm3, a factor of 4–5 lower than the solid solubility of B in Si at 900 °C. Using multiple implant/anneal steps, we demonstrate here that implanted, electrically active B can be introduced up to the solid solubility limit while avoiding dislocation formation.
    Type of Medium: Electronic Resource
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  • 5
    Electronic Resource
    Electronic Resource
    Woodbury, NY : American Institute of Physics (AIP)
    Applied Physics Letters 59 (1991), S. 797-799 
    ISSN: 1077-3118
    Source: AIP Digital Archive
    Topics: Physics
    Notes: Heavily P-doped Si layers have been grown at very low temperature (〈600 °C) by rf plasma chemical vapor deposition. Films grown by vapor phase epitaxy (VPE) or solid phase epitaxy (SPE) are compared. By VPE growth, fully electrically activated films with a P concentration in excess of 1021 cm−3 and steep doping profiles (≤4 nm/dec) were obtained. SPE films are not fully activated and an anomalously fast P diffusion is observed during the crystallization at 600 °C. On the other hand, the Hall mobility of VPE films is significantly lower than that of SPE films.
    Type of Medium: Electronic Resource
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  • 6
    Electronic Resource
    Electronic Resource
    Woodbury, NY : American Institute of Physics (AIP)
    Applied Physics Letters 64 (1994), S. 354-356 
    ISSN: 1077-3118
    Source: AIP Digital Archive
    Topics: Physics
    Notes: The selective chemical etching of silicon containing an impurity profile was used to obtain surface topography related to the local carrier concentration. Atomic force microscopy (AFM) was then used to image this topography. Through a calibration curve of etched depth versus carrier concentration, established by etching uniformly doped epitaxial silicon layers, it is possible to convert the AFM topographical data into carrier concentration. The technique was applied to measure directly the carrier distribution in submicron devices.
    Type of Medium: Electronic Resource
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  • 7
    Electronic Resource
    Electronic Resource
    [S.l.] : American Institute of Physics (AIP)
    Journal of Applied Physics 67 (1990), S. 7337-7347 
    ISSN: 1089-7550
    Source: AIP Digital Archive
    Topics: Physics
    Notes: The oxygen content in zone melting recrystallization silicon-on-insulator (ZMR SOI) layers with thicknesses ranging between 0.5 and 25 μm obtained with a movable lampheater is studied. Secondary-ion-mass spectrometry profiling as well as numerical calculations are presented. The simulations are based on oxygen redistribution during cooling down. In the model it is assumed that the interface reaction is fast enough to be not the rate-limiting step in the redistribution process. Consequently, the oxygen transport was considered to be entirely diffusion limited. Good agreement was found between the measurements and calculated values. The profiles show a maximum at the center of the layer and symmetrically depleted regions in the top and bottom of the silicon film. It has been generally accepted that ZMR SOI layers have a high oxygen concentration corresponding to the saturation level at melting point. In the present study, however, we show that in the 0.5-μm layers the oxygen concentration is as low as 1×1017(O atoms)/cm3.
    Type of Medium: Electronic Resource
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  • 8
    Electronic Resource
    Electronic Resource
    s.l. ; Stafa-Zurich, Switzerland
    Solid state phenomena Vol. 19-20 (Jan. 1991), p. 449-454 
    ISSN: 1662-9779
    Source: Scientific.Net: Materials Science & Technology / Trans Tech Publications Archiv 1984-2008
    Topics: Physics
    Type of Medium: Electronic Resource
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  • 9
    ISSN: 1432-0630
    Keywords: 81.15.−z ; 81.40.−z ; 68.55.−a
    Source: Springer Online Journal Archives 1860-2000
    Topics: Mechanical Engineering, Materials Science, Production Engineering, Mining and Metallurgy, Traffic Engineering, Precision Mechanics , Physics
    Notes: Abstract The formation of (TixW1−x)Si2/(TixW1−x)N, by rapid thermal processing of TixW1−x on Si in an N2 ambient is investigated. An activation energy of 1.7 eV is obtained for silicide formation. A distinct snow-ploughing of As atoms is observed during silicide formation whereas the interfacial B concentration decreases with increasing silicide formation temperature. The diffusion barrier properties of the (TixW1−x)Si2/(TixWi1−x)N stack in contact with Al is investigated upon post-metal annealing. No interaction between the layers is found for temperatures as high as 475°C after 60 min. The improved thermal stability of the (TixW1−x)N layer in contact with Al is attributed to nitrogen blocking of the grain boundaries.
    Type of Medium: Electronic Resource
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  • 10
    ISSN: 0142-2421
    Keywords: Chemistry ; Polymer and Materials Science
    Source: Wiley InterScience Backfile Collection 1832-2000
    Topics: Physics
    Notes: The structural and quantitative chemical analyis of tungsten nitrides and titanium-tungsten nitrides with variable N content (denoted as W(N) and TiW(N)) are explored by a combination of different analysis techniques. Special attention is given to the unraveling by XPS of the different binding states that are present in the surface contamination layer and in the bulk of the layers. The determination of our own sensitivity factors is essential for accurate quantification of both XPS and AES data. Comparison of the different techniques shows the presence of strong preferential sputtering for W(N) alloys, whereas this effect is unimportant for TiW(N). The influence of the vacuum of the analysis chamber of XPS and AES on the results is studied thoroughly.
    Additional Material: 11 Ill.
    Type of Medium: Electronic Resource
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