ISSN:
0032-3888
Keywords:
Chemistry
;
Chemical Engineering
Source:
Wiley InterScience Backfile Collection 1832-2000
Topics:
Chemistry and Pharmacology
,
Mechanical Engineering, Materials Science, Production Engineering, Mining and Metallurgy, Traffic Engineering, Precision Mechanics
,
Physics
Notes:
The X-ray and deep UV radiation response is described for resist systems consisting of poly(4-tert-butoxycarbonyloxystyrene-co-sulfur dioxide) PTBSS combined with an arylmethyl sulfone. A 2:1 4-tert-butoxycarbonyloxystyrene (TBS): sulfur dioxide (SO2) resist has been found to function as a highly sensitive, 1.4 nm X-ray, single-component, chemically amplified resist. The same resist, however, exhibits reduced sensitivity to 0.8 nm X-rays and deep UV (248 nm) radiation. Improvement in 0.8 nm X-ray sensitivity is achieved by the addition of 12 mol% bis(3,4-dichlorobenzyl) sulfone (DCBS) to the 2:1 TBS:SO2 resist. For this two-component resist formulation, the 0.8 nm X-ray sensitive improved from 〉375 to 125 mJ/cm2. Similarly, the sensitivity of the 3:1 TBS:SO2 copolymer to deep UV radiation improves to 40 mJ/cm2 with addition of 10 mol% DCBS. Sulfones, such as DCBS, provide two-component resist formulations capable of 〈0.5 μm resolution.
Additional Material:
6 Ill.
Type of Medium:
Electronic Resource
URL:
http://dx.doi.org/10.1002/pen.760322006
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