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  • 1995-1999  (4)
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Publisher
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Year
  • 1
    Electronic Resource
    Electronic Resource
    Springer
    Mathematische Annalen 315 (1999), S. 61-95 
    ISSN: 1432-1807
    Source: Springer Online Journal Archives 1860-2000
    Topics: Mathematics
    Type of Medium: Electronic Resource
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  • 2
    Electronic Resource
    Electronic Resource
    Springer
    Microsystem technologies 3 (1996), S. 7-9 
    ISSN: 1432-1858
    Source: Springer Online Journal Archives 1860-2000
    Topics: Electrical Engineering, Measurement and Control Technology , Technology
    Notes: Abstract  The fabrication of LIGA mask is a very important step in LIGA process. Usually an intermediate mask with gold absorber pattern of 2 μm thickness is fabricated firstly using gold electroplating for absorber pattern in the resist structure written by Electron Beam (e-Beam), then the LIGA mask can be copied from the intermediate mask using synchrotron radiation lithography and gold electroplating. Recently, we use photolithography (instead of e-beam) to make the primary structure, and produce the intermediate mask with gold absorber pattern of 1.5 μm thickness produced by etching gold film with 1.5 μm thickness under the photoresist structure using Ar+. The LIGA mask with absorber pattern of 13 μm thickness is copied from the intermediate mask using synchrotron radiation lithography and gold electroplating.
    Type of Medium: Electronic Resource
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  • 3
    Electronic Resource
    Electronic Resource
    Springer
    Microsystem technologies 4 (1998), S. 58-60 
    ISSN: 1432-1858
    Source: Springer Online Journal Archives 1860-2000
    Topics: Electrical Engineering, Measurement and Control Technology , Technology
    Notes: Abstract  An advanced light source has been proposed by Municipality of Shanghai and the Chinese Academy of Sciences. It would be scheduled in the beginning of next century. The main propose is for the fundamental scientific research and industrial application etc. The parameters of Shanghai Synchrotron Radiation Facility (SSRF) are listed. The LIGA experimental station are planned to build in the first phase of construction of SSRF. Main parameters, spectrum and power density of beam lines for deep etching lithography are illustrated.
    Type of Medium: Electronic Resource
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  • 4
    Electronic Resource
    Electronic Resource
    Springer
    Microsystem technologies 2 (1996), S. 126-129 
    ISSN: 1432-1858
    Source: Springer Online Journal Archives 1860-2000
    Topics: Electrical Engineering, Measurement and Control Technology , Technology
    Notes: Abstract  Beijing Synchrotron Radiation Facility is a partly dedicated Synchrotron Radiation Source which is operated since the end of 1990. Some main specifications of the source are briefly illustrated. Beam line 3B1 is a soft X-ray beam line extracted from bending magnet exploited for lithography. In the end of 3B1 there is a simple exposure chamber, LIGA patterns were exposured in the chamber. The LIGA technologies in BSRF are in the basic research stage, only a few of demonstrated patterns of deep etching structure were obtained. A sample of electroplating apparatus has been set up for getting metal structure. Further plan of the next phase of LIGA technology are presented. A new exposure scanner is being designed and would be set up on the another beam line 4W1 which is extracted from wiggle source with critical wavelength 2.2 A which seems quite suitable for deep etching exposure.
    Type of Medium: Electronic Resource
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