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Memristor and selector devices fabricated from HfO2−xNx (2016)

B. J. Murdoch, D. G. McCulloch, R. Ganesan, D. R. McKenzie, M. M. M. Bilek and J. G. Partridge

American Institute of Physics (AIP)

In: Applied Physics Letters

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Publication Date: 2016-04-08

Description: Monoclinic HfO 2−x N x has been incorporated into two-terminal devices exhibiting either memristor or selector operation depending on the controlled inclusion/suppression of mobile oxygen vacancies. In HfO 2 memristors containing oxygen vacancies, gradual conductance modulation, short-term plasticity, and long-term potentiation were observed using appropriate voltage-spike stimulation, suggesting suitability for artificial neural networks. Passivation of oxygen vacancies, confirmed by X-ray absorption spectroscopy, was achieved in HfO 2−x N x films by the addition of nitrogen during growth. Selector devices formed on these films exhibited threshold switching and current controlled negative differential resistance consistent with thermally driven insulator to metal transitions.

Print ISSN: 0003-6951

Electronic ISSN: 1077-3118

Topics: Physics

Published by American Institute of Physics (AIP)

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