ISSN:
1089-7623
Source:
AIP Digital Archive
Topics:
Physics
,
Electrical Engineering, Measurement and Control Technology
Notes:
This article presents a metal plasma source ion implantation and deposition system, which is a qualitative extension of plasma source ion implantation by combining pulsed metal plasma and steady-state gas plasma. The pulsed metal plasma is produced by pulsed cathodic arc discharge and the steady-state gas plasma by magnetic multipole filament discharge. The existence of gas plasma greatly facilitates the breakdown of the pulsed cathodic arc plasma source, which does not need the conventional trigger system. Some operation characteristics of this system were measured. It was shown that the cathodic arc plasma parameters depend strongly on gas pressure. 0.45% C steel was modified in nitrogen plasma and pulsed aluminum plasma. The corrosion resistance ability of the treated 0.45% C steel sample was increased by about 30 times over that of the untreated sample. AlN/Al2O3/Al composite film was deposited on 0.45% C steel using a glow-arc technique. © 1999 American Institute of Physics.
Type of Medium:
Electronic Resource
URL:
http://dx.doi.org/10.1063/1.1149674
