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Crystallinity and average grain size of films grown by chemical vapor deposition (1995)

Kim, S. K. ; Lee, Hong H.

[S.l.] : American Institute of Physics (AIP)

Journal of Applied Physics 78 (1995), S. 3809-3811

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ISSN: 1089-7550

Source: AIP Digital Archive

Topics: Physics

Notes: Probabilities are utilized to arrive at a relationship that defines the boundary for the monocrystalline region in terms of the partial pressure of the source gas and the deposition temperature. Also derived is a relationship for the average grain size of polycrystalline film. The results are restricted to the complete or near-complete condensation case of nucleation. © 1995 American Institute of Physics.

Type of Medium: Electronic Resource

URL: http://dx.doi.org/10.1063/1.359895

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