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Deposition of amorphous BaTiO3 optical films at low temperature (1993)

Liu, W.-T. ; Lakshmikumar, S. T. ; Knorr, D. B. ; [et al.]

Woodbury, NY : American Institute of Physics (AIP)

Applied Physics Letters 63 (1993), S. 574-576

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ISSN: 1077-3118

Source: AIP Digital Archive

Topics: Physics

Notes: A reactive partially ionized beam technique has been used to deposit amorphous BaTiO3 films at room temperature. The procedure employing independently controlled evaporation and ionization of Ba and TiO has been optimized to produce highly transparent films. Films deposited on quartz or glass show 100% optical transmission over the visible wavelengths with respect to the substrate. The refractive index can be varied over a range of 1.9–2.0 by varying the Ba/Ti ratio without effecting the optical transparency. Films with refractive indices up to 2.4 can be deposited but the optical transmission decreases. The best optical properties are obtained for films with near stoichiometric Ba/Ti ratio. Annealing at temperatures less than 500 °C leads to densification of the films with a 2%–3% decrease in film thickness. The anneal increases the refractive index marginally. The optical band gap of the films was calculated from the experimental transmission plots. The Eg value of 4.6±0.1 eV for stoichiometric films decreases to 4.3 eV for nonstoichiometric films.

Type of Medium: Electronic Resource

URL: http://dx.doi.org/10.1063/1.109981

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