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Thin vanadium-aluminium alloy film resistivity saturation (1987)

Stolecki, B. ; Borodziuk-Kulpa, A. ; Zahorowski, W.

Springer

Journal of materials science 22 (1987), S. 2933-2936

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ISSN: 1573-4803

Source: Springer Online Journal Archives 1860-2000

Topics: Mechanical Engineering, Materials Science, Production Engineering, Mining and Metallurgy, Traffic Engineering, Precision Mechanics

Notes: Abstract Studies of the resistivity and structure of vanadium-aluminium alloy films have been performed. V0.93Al0.07 alloy films have been evaporated with an electron gun in an ultrahigh vacuum (ϱ ∼ 10−7 torr) on to quartz substrates at room temperature. Resistivity against temperature has been studiedin situ in vacuum of 10−10 to 10−8 torr in the temperature range 300 to 850 K. A resistivity saturation effect has been observed. The analysis of this effect has been conducted on the basis of the shunt resistance model.

Type of Medium: Electronic Resource

URL: http://dx.doi.org/10.1007/BF01086493

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