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  • 1
    Electronic Resource
    Electronic Resource
    A mathematical model of pulse plating on a rotating disk electrode (1990)
    Hoboken, NJ : Wiley-Blackwell
    AIChE Journal 36 (1990), S. 187-196 
    Details
    ISSN: 0001-1541
    Keywords: Chemistry ; Chemical Engineering
    Source: Wiley InterScience Backfile Collection 1832-2000
    Topics: Chemistry and Pharmacology , Process Engineering, Biotechnology, Nutrition Technology
    Notes: A galvanostatic pulse plating model is presented for the electrodeposition of an alloy on a rotating disk electrode. This model is used to simulate the electrodeposition of nickel/chrome alloys. The mass transport equations used in the model include the effects of diffusion, migration and convection; and the electrode kinetics are described by the Butler-Volmer equation. It is predicted that the effect of ionic migration is significant and therefore should be included in models of pulse plating.
    Additional Material: 12 Ill.
    Type of Medium: Electronic Resource
    URL: http://dx.doi.org/10.1002/aic.690360204
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