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Measurement of electron emission due to energetic ion bombardment in plasma source ion implantation (1991)

Shamim, M. M. ; Scheuer, J. T. ; Fetherston, R. P. ; [et al.]

[S.l.] : American Institute of Physics (AIP)

Journal of Applied Physics 70 (1991), S. 4756-4759

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ISSN: 1089-7550

Source: AIP Digital Archive

Topics: Physics

Notes: An experimental procedure has been developed to measure electron emission due to energetic ion bombardment during plasma source ion implantation. Spherical targets (radius=2 cm) of copper, stainless steel, graphite, titanium alloy (Ti-6Al-4V) and aluminum alloy (6061) were biased negatively to 20, 30, and 40 kV in argon and nitrogen plasmas. A Langmuir probe was used to detect the propagating sheath edge and a Rogowski transformer was used to measure the current to the target. The measurements of electron emission coefficients compare well with those measured under similar conditions [B. Szapiro and J. J. Rocca, J. Appl. Phys. 65, 3713 (1989)].

Type of Medium: Electronic Resource

URL: http://dx.doi.org/10.1063/1.349067

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