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Ion beam deposition of in situ superconducting Y-Ba-Cu-O films (1990)

Klein, J. D. ; Yen, A. ; Clauson, S. L.

Woodbury, NY : American Institute of Physics (AIP)

Applied Physics Letters 56 (1990), S. 394-396

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ISSN: 1077-3118

Source: AIP Digital Archive

Topics: Physics

Notes: Oriented superconducting YBa2Cu3O7 thin films were deposited on yttria-stabilized zirconia substrates by ion beam sputtering of a nonstoichiometric oxide target. The films exhibited zero-resistance critical temperatures as high as 80.5 K without post-deposition anneals. Both the deposition rate and the c lattice parameter data displayed two distinct regimes of dependence on the beam power of the ion source. Low-power sputtering yielded films with large c dimensions and low Tc's. Higher power sputtering produced a continuous decrease in the c lattice parameter and an increase in critical temperatures.

Type of Medium: Electronic Resource

URL: http://dx.doi.org/10.1063/1.103292

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