ISSN:
0025-116X
Keywords:
Chemistry
;
Polymer and Materials Science
Source:
Wiley InterScience Backfile Collection 1832-2000
Topics:
Chemistry and Pharmacology
,
Physics
Notes:
Upon treatment with ultraviolet irradiation (wavelength λ = 254 nm) the resist containing both poly(p-trialkylsiloxystyrene) and a triarylsulfonium salt undergoes photoinduced structural modifications which convert the silylated polymer into either poly(p-hydroxystyrene) or poly[(p-trialkylsioxystyrene)-co-(p-hydroxystyrene)]. Aging with the use of antimonate salts rather than arsenate salts, and bulky alkyl groups favour O—Si bond cleavage.
Additional Material:
11 Ill.
Type of Medium:
Electronic Resource
URL:
http://dx.doi.org/10.1002/macp.1992.021930114