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  • 1
    Electronic Resource
    Electronic Resource
    Influence de la quantité d'un sel de sulfonium sur la coupure des liaisons O—Si et sur la solubilité d'un mélange renfermant le sel et le poly(p-triméthylsiloxystyrène) et irradié par des UV (1992)
    Weinheim : Wiley-Blackwell
    Angewandte Makromolekulare Chemie 198 (1992), S. 123-133 
    Details
    ISSN: 0003-3146
    Keywords: Chemistry ; Polymer and Materials Science
    Source: Wiley InterScience Backfile Collection 1832-2000
    Topics: Chemistry and Pharmacology , Physics
    Description / Table of Contents: If coating solutions obtained by dissolving poly(p-trimethylsiloxystyrene) together with one of the salts (C6H5)2(C6H5SC6H4)SSbF6 or (C6H5)3SAsF6 in a solvent such as 3-pentanone are aged, the percentage of O—Si(CH3)3 bonds cleaved by irradiation at a given intensity (λ = 254 nm) and after post-annealing depends on the amount of salt introduced. The same result is observed with respect to the solubility of the resist when it is treated with the basic solvent MF-319.
    Notes: Si on laisse vieillir les solutions d'enduction obtenues en solubilisant le poly(p-tri-méthylsiloxystyrene) et l'un des sels (C6H5)2(C6H5SC6H4)SSbF6 ou (C6H5)3SAsF6 dans un solvant tel que la 3-pentanone, on constate que le pourcentage de coupure des liaisons O—Si(CH3)3 obtenue après irradiation (λ = 254 nm) avec une dose donnèe et après postcuisson dèpend de la quantitè de sel introduit. I1 en est de même de la solubilité de la rèsine ainsi traitee dans le solvant basique MF 319.
    Additional Material: 1 Ill.
    Type of Medium: Electronic Resource
    URL: http://dx.doi.org/10.1002/apmc.1992.051980111
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  • 2
    Electronic Resource
    Electronic Resource
    Etudes microlithographiques de résines négatives renfermant des unités tétrathiafulvalènes sensibles aux électrons (1993)
    Weinheim : Wiley-Blackwell
    Angewandte Makromolekulare Chemie 204 (1993), S. 1-17 
    Details
    ISSN: 0003-3146
    Keywords: Chemistry ; Polymer and Materials Science
    Source: Wiley InterScience Backfile Collection 1832-2000
    Topics: Chemistry and Pharmacology , Physics
    Description / Table of Contents: In order to solve the polymer swelling which limits the resolution for negative resists, new resists (R) including polymers containing the tetrathiafulvalenylcarbonyloxymethyl radical and dibromotetrachloroethane were developed where the swelling does not appear. In order to study the influence of the nature of the radical bearing the tetrathiafulvalene unit in the polymers upon the microlithographic properties of the R resists, polymers containing the tetrathiafulvalenylphenoxymethyl radical were also studied. The resists have been tested under electron beam irradiation. The dependence of resist sensitivity on molecular weight is reported. Resolutions between 0,1 and 0,4 μm were obtained. These resists are shown to have a desirable combination of properties, including high sensitivity and high resolution.
    Notes: Pour résoudre le phénomène de gonflement qui limite la résolution des résines micro lithographiques classiques, nous nous sommes intéressés à de nouvelles résines avec lesquelles ce phénomène n'apparaǐt pas. Nous avons retenu pour notre étude les résines R qui renferment en mélange un polymère porteur de radicaux tétrathiafulvalénylcarbonyloxyméthyles et le dibromotétrachloroéthane. Afin de voir l'influence de la nature du radical porteur de l'unité tetrathiafulvalène dans le polymère sur les propriétés microlithographiques des résines R, nous nous sommes également intéressés aux polymères renfermant des radicaux tétrathiafulvalénoxyméthyles. Les résines R ont été testées sous irradiation électronique. Leurs sensibilités dépendent en outre de la valeur de la masse molaire du polymère. Des résolutions comprises entre 0,1 et 0,4 μm ont été obtenues. Ce type de résines possèdent un certain nomber de propriétés intéressantes telles que des sensibilités élevées et de bonnes résolutions.
    Additional Material: 10 Ill.
    Type of Medium: Electronic Resource
    URL: http://dx.doi.org/10.1002/apmc.1993.052040101
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  • 3
    Electronic Resource
    Electronic Resource
    Etudes microlithographiques de résines négatives renfermant des unités tétrathiafulvalènes sensibles aux UV (1992)
    Weinheim : Wiley-Blackwell
    Angewandte Makromolekulare Chemie 199 (1992), S. 15-31 
    Details
    ISSN: 0003-3146
    Keywords: Chemistry ; Polymer and Materials Science
    Source: Wiley InterScience Backfile Collection 1832-2000
    Topics: Chemistry and Pharmacology , Physics
    Description / Table of Contents: In order to solve the problem of polymer swelling which limits the resolution of negative resists, we have developed new resists where the swelling does not appear. For our study, we developed resists including polymers containing the tetrathiafulvalenylcarbonyloxymethyl radical and dibromotetrachloroethane. In order to study the influence of the nature of the radical bearing the tetrathiafulvalene unit in the polymers on the microlithographic properties of these resists, we also studied polymers containing the tetrathiafulvalenylphenoxymethyl radical. The resists have been tested under UV irradiation. The dependence of resist sensitivity on molecular weight is reported.
    Notes: Pour résoudre le phéomène de gonflement qui limite la résolution des résines microlithographiques classiques, nous nous sommes intéressés à de nouvelles résines avec lesquelles ce phénomène n'apparait pas. Nous avons retenu pour notre étude les résines R qui renferment en mélange un polymère porteur de radicaux tétrathiafulvalénylcarbonyloxyméthyles et le dibromotétrachloroéthane. Afin de voir l'influence de la nature du radical porteur de l'unité tétrathiafulvalène dans le polymtrè sur les propriétés microlithographiques des résines R, nous nous sommes également intéressés aux polymères renfermant des radicaux tétrathiafulvalénylphénoxymethyles. Les résines R ont été testées sous irradiation UV. Leurs sensibilités dépendent en outre de la valeur de la masse molaire du polymèr.
    Additional Material: 4 Ill.
    Type of Medium: Electronic Resource
    URL: http://dx.doi.org/10.1002/apmc.1992.051990103
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  • 4
    Electronic Resource
    Electronic Resource
    ÉTude préliminaire des propriétés microlithographiques d'une résine renfermant un polyimide et un bis-azide sensible aux UV lointains (1996)
    Weinheim : Wiley-Blackwell
    Angewandte Makromolekulare Chemie 242 (1996), S. 65-84 
    Details
    ISSN: 0003-3146
    Keywords: Chemistry ; Polymer and Materials Science
    Source: Wiley InterScience Backfile Collection 1832-2000
    Topics: Chemistry and Pharmacology , Physics
    Description / Table of Contents: A preliminary study of the microlithographic properties of resins obtained by mixing a polyimide with a bis-azide has shown the possibility to be used in the far UV.The solutions of the resins are easily processed to give films with a good control of the thickness. Moreover, the films obtained are sensitive to UV irradiation at 254 nm. The irradiated parts are insoluble in a mixture of solvents constituted of water and dioxane or water and 1-N-methylpyrrolidone, whereas the non-irradiated regions are soluble in these solvent mixtures.
    Notes: L'étude préliminaire des propriétés microlithographiques des résines obtenues en mélangeant un polyimide et un bis-azide a permis de montrer que de telles résines pourraient probablement être utilisées en tant que résines microlithographiques sensibles aux UV lointains. En effet ces résines donnent des couchages homogènes qui ont des épaisseurs convenables. De plus, elles sont très sensibles aux irradiations: elles subissent alors des modifications de structure lorsqu'on les irradie par des radiations de longueur d'onde égale à 254 nm. Les parties ainsi insolées sont insolubles dans les solvants constitués par des mélanges d'eau et de dioxane ou d'eau et de 1-N-méthylpyrrolidone alors que ces mêmes solvants solubilisent parties non insolées.
    Additional Material: 3 Ill.
    Type of Medium: Electronic Resource
    URL: http://dx.doi.org/10.1002/apmc.1996.052420104
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  • 5
    Electronic Resource
    Electronic Resource
    Etude de l'oxydation de polystyrènes chlorométhylés renfermant de nouveaux radicaux tétrathiafulvalénylcarbonyloxyméthyles (1992)
    Weinheim : Wiley-Blackwell
    Angewandte Makromolekulare Chemie 197 (1992), S. 89-106 
    Details
    ISSN: 0003-3146
    Keywords: Chemistry ; Polymer and Materials Science
    Source: Wiley InterScience Backfile Collection 1832-2000
    Topics: Chemistry and Pharmacology , Physics
    Description / Table of Contents: The chloromethylated polystyrenes bearing tetrathiafulvalenylcarbonyloxymethyl groups can be oxidized. We have shown that ion radical salts are obtained from these polymers and carbon tetrabromide after irradiation with UV light. Charge transfer complexes were prepared by mixing these polymers and 2,3-dichloro-5,6-dicyanobenzoquinone. The possible presence of sulfoxides as a result of oxidation of some tetrathiafulvalene units could explain the difficulties we have observed to filter solutions of these polymers.
    Notes: Les polystyrènes chlorométhylés renfermant des radicaux tétrathiafulvalénylcarbonyloxyméthyles peuvent être oxydés. Ainsi la formation de sels d'ions radicaux obtenus à partir de ces polymères et de tétrabromure de carbone, irradiés sous UV, a été mise en évidence. Des complexes de transfert de charge ont été préparés en mettant en présence ces polymères et de la 2,3-dichloro-5,6-dicyanobenzoquinone. La présence de sulfoxydes non décelés et résultant de l'oxydation de certaines unités de tetrathiafulvalène contenus dans ces polymères pourrait expliquer les problèmes rencontrés lors de la filtration de leurs solutions.
    Additional Material: 4 Ill.
    Type of Medium: Electronic Resource
    URL: http://dx.doi.org/10.1002/apmc.1992.051970108
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  • 6
    Electronic Resource
    Electronic Resource
    Synthèse de polystyrènes chlorométhylés renfermant des radicaux tétrathiafulvalène carbonyloxyméthyles (1989)
    New York : Wiley-Blackwell
    Die Makromolekulare Chemie 190 (1989), S. 2747-2758 
    Details
    ISSN: 0025-116X
    Keywords: Chemistry ; Polymer and Materials Science
    Source: Wiley InterScience Backfile Collection 1832-2000
    Topics: Chemistry and Pharmacology , Physics
    Notes: In order to solve the problem of polymer swelling, which limits the resolution for negative resists, new resists were developed which show no swelling. The undesirable swelling can be suppressed by converting nonpolar crosslinked polymers into polar ones, which are soluble after irradiation. This aim was attained by mixing a polystyrene bearing tetrathiafulvalenyl (TTF) groups with 1,2-dibromo-1,1,2,2-tetrachloroethane. For our study, we applied resists including poly(4-chloromethylstyrene)s containing tetrathiafulvalenecarbonyloxymethyl groups (1 and 2). Poly(4-chloromethylstyrene)s (4) or poly[styrene-co-(4-chloromethyl)styrene]s (5) with a variety of controlled molecular weights and molecular weight distributions were prepared by radical chain polymerization. The reaction of cesium tetrathiafulvalenecarboxylate (3) with 4 or 5 was carried out and the resultant substituted polymers 1 and 2 were characterized.
    Additional Material: 2 Ill.
    Type of Medium: Electronic Resource
    URL: http://dx.doi.org/10.1002/macp.1989.021901108
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  • 7
    Electronic Resource
    Electronic Resource
    Synthèse et caractérisation de polystyrènes siliciés (1991)
    New York : Wiley-Blackwell
    Die Makromolekulare Chemie 192 (1991), S. 1467-1482 
    Details
    ISSN: 0025-116X
    Keywords: Chemistry ; Polymer and Materials Science
    Source: Wiley InterScience Backfile Collection 1832-2000
    Topics: Chemistry and Pharmacology , Physics
    Notes: Poly(p-trimethylsiloxystyrene) (1a), poly[p-(tert-butyldimethylsiloxy)styrene] (1b), poly[p-(trimethylsiloxy)-α-methylstyrene] (1c), poly[p-(tert-butyldimethylsiloxy)-α-methylstyrene) (1d) and poly{p-[2-(tert-butyldimethylsiloxy)ethyl]styrene]} (1e) were prepared by free-radical or cationic polymerization of the corresponding monomers. Poly{[p-[2(trimethylsiloxy)ethyl]styrene]-co-[p-(2-hydroxyethyl)styrene]} (2a) was synthetized by anionic polymerization of the corresponding trimethylsilylated monomer, followed by acid hydrolysis of the resulting polymer. Poly{[p-[2-(trimethylsiloxy)ethyl]styrene]-co-[p-(tert-butoxycarbonyloxy)styrene]} (2b) were prepared by free-radical polymerization of the corresponding monomers.
    Additional Material: 1 Ill.
    Type of Medium: Electronic Resource
    URL: http://dx.doi.org/10.1002/macp.1991.021920702
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  • 8
    Electronic Resource
    Electronic Resource
    Etude des propriétés microlithographiques d'une résine siliciée renfermant en mélange le poly(p-triméthylsiloxystyrène) et le sel (C6H5)3SAsF6Manuscrit remaní du juillet 16, 1991 (1992)
    New York : Wiley-Blackwell
    Die Makromolekulare Chemie 193 (1992), S. 1289-1298 
    Details
    ISSN: 0025-116X
    Keywords: Chemistry ; Polymer and Materials Science
    Source: Wiley InterScience Backfile Collection 1832-2000
    Topics: Chemistry and Pharmacology , Physics
    Notes: The study of a photoresist containing poly(p-trimethylsiloxystyrene) (1, poly[1-(4-trimethyl-siloxyphenyl)ethylene]) mixed with (C6H5)3SAsF6, which could be employed in a bilevel pattern-transfer process, is reported. The onium salt undergoes efficient photolysis under UV radiation, to generate strong acids, responsible of the cleayage of the silicon-containing side groups. The first results obtained show that this kind of resist could be used in microlithography, because it displays a very good sensitivity to deep UV and an excellent resistance to oxygen plasma. The syntheses of the compounds and substances used in this work are described.
    Additional Material: 2 Ill.
    Type of Medium: Electronic Resource
    URL: http://dx.doi.org/10.1002/macp.1992.021930605
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  • 9
    Electronic Resource
    Electronic Resource
    Synthèse de polystyrènes chlorométhylés renfermant de nouveaux groupements tétrathiafulvalénylcarbonyloxyméthylesManuscrit remanié du juillet 17, 1991. (1992)
    New York : Wiley-Blackwell
    Die Makromolekulare Chemie 193 (1992), S. 1337-1350 
    Details
    ISSN: 0025-116X
    Keywords: Chemistry ; Polymer and Materials Science
    Source: Wiley InterScience Backfile Collection 1832-2000
    Topics: Chemistry and Pharmacology , Physics
    Notes: In order to conserve high contrast while improving the sensitivity of microlithographic resins made up of polystyrene bearing tetrathiafulvalene (TTF) units, we prepared new polystyrenes containing tetrathiafulvalenylcarbonyloxymethyl groups which are methylated or non-methylated. The polymers were synthesized by reaction of poly[styrene-co-(p-chloromethyl-styrene)] with the corresponding caesium tetrathiafulvalenecarboxylate. To optimize this grafting reaction, preliminary reactions were carried out with model molecules.
    Additional Material: 3 Ill.
    Type of Medium: Electronic Resource
    URL: http://dx.doi.org/10.1002/macp.1992.021930610
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  • 10
    Electronic Resource
    Electronic Resource
    Fast atom bombardment, frit fast atom bombardment and electrospray ionization mass spectrometric study of organic salts C2+ 2X-: Matrix and anion effects (1995)
    Chichester : Wiley-Blackwell
    Biological Mass Spectrometry 30 (1995), S. 985-992 
    Details
    ISSN: 1076-5174
    Keywords: Chemistry ; Analytical Chemistry and Spectroscopy
    Source: Wiley InterScience Backfile Collection 1832-2000
    Topics: Chemistry and Pharmacology , Physics
    Notes: The fast atom bombardment (FAB), frit-FAB and electrospray ionization mass spectra of bis-ammonium salts, C2+ 2X-, were compared. The most informative spectra were the FAB mass spectra with m-nitrobenzyl alcohol as matrix and the Frit-FAB mass spectra. The nucleophilic character of the iodine anion was established.
    Additional Material: 2 Ill.
    Type of Medium: Electronic Resource
    URL: http://dx.doi.org/10.1002/jms.1190300708
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