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  • 1
    Publication Date: 2019-07-17
    Description: This dictionary is the first attempt to express the wealth of archaic logbook wind force terms in a form that is comprehensible to the modern-day reader. Oliver and Kington (1970) and Lamb (1982) have drawn attention to the importance of logbooks in climatic studies, and Lamb (1991) offered a conversion scale for early eighteenth century English wind force terms, but no studies have thus far pursued the matter to any greater depth. This text attempts to make good this deficiency, and is derived from the research undertaken by the CLIWOC project1 in which British, Dutch, French and Spanish naval and merchant logbooks from the period 1750 to 1850 were used to derive a global database of climatic information. At an early stage in the project it was apparent that many of the logbook weather terms, whilst conforming to a conventional vocabulary, possessed meanings that were unclear to twenty-first century readers or had changed over time. This was particularly the case for the important element of wind force; but no special plea is entered for the evolution in nautical vocabulary, which often reflected more wide-ranging changes in the respective native languages.The key objective was to translate the archaic vocabulary of the late eighteenth and early nineteenth century mariner into expressions directly comparable with the Beaufort Scale (see Appendix I). Only then could the projects scientific programme be embarked upon. This dictionary is the result of the largest undertaking into logbook studies that has yet been carried out. Several thousand logbooks from British, Dutch, French and Spanish archives were examined, and the exercise offered a unique opportunity to explore the vocabulary of the one hundred year period beginning in 1750. The logbooks from which the raw data have been abstracted range widely across the North and South Atlantic and the Indian Oceans. Only the Pacific, largely in consequence of the paucity of regular naval activity in that area, is not well represented. The range of climates encountered in this otherwise wide geographic domain gives ample opportunity for the full range of the mariners nautical weather vocabulary to be assessed, from the calms of the Equatorial regions, through the gales of the mid-latitude systems to the fearsome storms of the tropical latitudes. The Trade Winds belts, the Doldrums, the unsettled mid-latitudes, even the icy wastes of the high latitudes, are all embraced in this study. It is not here intended to pass any judgements on the climatological record of the logbooks, and this text seeks only to provide a means of understanding archaic wind force terms and, other than to indicate those items that were not commonly used, no information is given on the frequency with which different terms appeared in the logbooks. Attention is, furthermore, confined to Dutch, English, French and Spanish because these once great imperial powers were the only nations able to support wide-ranging ocean-going fleets with their attendant collections of logbooks and documents over this long period of time. The work is offered to the wider academic community in the hope that they will prove to be of as much value as it has been to the CLIWOC team.
    Repository Name: EPIC Alfred Wegener Institut
    Type: Article , notRev
    Format: application/pdf
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  • 2
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    In:  http://aquaticcommons.org/id/eprint/9548 | 115 | 2012-10-04 07:20:11 | 9548 | WorldFish Center
    Publication Date: 2021-07-07
    Description: The Global Coral Reef Monitoring Network (GCRMN) is an operational unit of the International Coral Reef Initiative (ICRI), established in 1995 and maintained by the Australian Institute of Marine Science (AIMS). The main responsibilities are to provide data and information on the global status of coral reefs, assess how people use and interact with reefs, assist coral reef management, and raise awareness among all stakeholders of the status of reefs and the need for urgent action. It is represented by 17 regional nodes, with overall coordination by a global coordinator based at AIMS.
    Keywords: Aquaculture ; Fisheries ; Coral reefs ; Resource management ; Information handling
    Repository Name: AquaDocs
    Type: article
    Format: application/pdf
    Format: application/pdf
    Format: 40-41
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  • 3
    Electronic Resource
    Electronic Resource
    [S.l.] : American Institute of Physics (AIP)
    Journal of Applied Physics 77 (1995), S. 4961-4966 
    ISSN: 1089-7550
    Source: AIP Digital Archive
    Topics: Physics
    Notes: A quantum well intermixing probe system has been used to study the damage in GaAs/AlGaAs due to exposure to C2F6 plasmas as a function of rf power. At an etching power of ≤80 W, the photoluminescence energy shift after rapid thermal processing is rf power dependent. The etch rate selectivities between SiO2 and GaAs, and between GaAs and AlGaAs were found to increase with decreasing power, while the etching of AlGaAs was inhibited at an rf power of 10 W and below. In situ reflectometry measurements during subsequent SiCl4 etching suggest that fluorocarbon contaminants are deposited on the GaAs surface during the C2F6 etch, that these contaminants protect the surface from oxidation in the air, and therefore the GaAs induction time in SiCl4 is reduced. However, during a SiCl4 etch of a GaAs/AlGaAs layered structure, these contaminants are redeposited on the AlGaAs surface resulting in an increased AlGaAs induction time, a nonconstant etch rate and surface roughening. © 1995 American Institute of Physics.
    Type of Medium: Electronic Resource
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  • 4
    Electronic Resource
    Electronic Resource
    s.l. : American Chemical Society
    Industrial & engineering chemistry 41 (1949), S. 841-846 
    ISSN: 1520-5045
    Source: ACS Legacy Archives
    Topics: Chemistry and Pharmacology , Process Engineering, Biotechnology, Nutrition Technology
    Type of Medium: Electronic Resource
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  • 5
    Electronic Resource
    Electronic Resource
    s.l. : American Chemical Society
    Industrial & engineering chemistry 42 (1950), S. 475-482 
    ISSN: 1520-5045
    Source: ACS Legacy Archives
    Topics: Chemistry and Pharmacology , Process Engineering, Biotechnology, Nutrition Technology
    Type of Medium: Electronic Resource
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  • 6
    Electronic Resource
    Electronic Resource
    s.l. : American Chemical Society
    Industrial & engineering chemistry 42 (1950), S. 2340-2343 
    ISSN: 1520-5045
    Source: ACS Legacy Archives
    Topics: Chemistry and Pharmacology , Process Engineering, Biotechnology, Nutrition Technology
    Type of Medium: Electronic Resource
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  • 7
    Electronic Resource
    Electronic Resource
    s.l. : American Chemical Society
    Industrial & engineering chemistry 44 (1952), S. 720-723 
    ISSN: 1520-5045
    Source: ACS Legacy Archives
    Topics: Chemistry and Pharmacology , Process Engineering, Biotechnology, Nutrition Technology
    Type of Medium: Electronic Resource
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  • 8
    Electronic Resource
    Electronic Resource
    [S.l.] : American Institute of Physics (AIP)
    Journal of Applied Physics 71 (1992), S. 3754-3759 
    ISSN: 1089-7550
    Source: AIP Digital Archive
    Topics: Physics
    Notes: We have carried out extensive Raman scattering investigations of the damage caused by the dry etching in GaAs. The heavily doped n+-GaAs (2–3×1018 cm−3) allows the study of the coupled longitudinal optical (LO) phonon-plasmon mode as a probe to assess the dry etch-induced damage. Three etching techniques were used including conventional radio frequency (rf) reactive ion etching (RIE), ion beam etching (IBE), and electron cyclotron resonance radio frequency reactive ion etching (ECR-RIE). It is demonstrated that the etched damage is confined to a few tens of nanometers after 20 nm of material is etched away. ECR-RIE etching produces the smallest damage. It is found that in RIE etching, as etching proceeds, the depletion depth saturates while for purely physical etching (IBE) the depletion depth increases continuously, at least under the conditions used.
    Type of Medium: Electronic Resource
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  • 9
    Electronic Resource
    Electronic Resource
    Woodbury, NY : American Institute of Physics (AIP)
    Applied Physics Letters 67 (1995), S. 3194-3196 
    ISSN: 1077-3118
    Source: AIP Digital Archive
    Topics: Physics
    Notes: A mixture of methane, hydrogen, and oxygen has been used to etch thin films of NiFe. The variation of etch rate with concentration of methane and oxygen has been investigated. By using a SrF2 mask, patterned by liftoff, small micrometer-sized elements have been fabricated. It is demonstrated that the use of CH4/H2/O2 as an etchant yields elements possessing similar micromagnetic properties to those produced by conventional liftoff. The process has also been successfully employed to etch other important magnetic thin films. © 1995 American Institute of Physics.
    Type of Medium: Electronic Resource
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  • 10
    Electronic Resource
    Electronic Resource
    Woodbury, NY : American Institute of Physics (AIP)
    Applied Physics Letters 67 (1995), S. 2660-2662 
    ISSN: 1077-3118
    Source: AIP Digital Archive
    Topics: Physics
    Notes: A selective reactive ion etching process which etches InP and InGaAs, but not InAlAs, using a mixture of SiCl4/SiF4/HBr gases has been developed. Optical emission spectroscopy shows that the dominant emitting species in the plasma are HBr+, Br, and Br2, with a weaker emission from SiBr and SiHBr. We believe that the bromosilanes or chlorosilanes of the form (SiHxBry,SiHxCly) are responsible for the etching of these In-containing compounds by the formation of indium bromosilanes and indium chlorosilanes. Using a flow rate ratio of SiCl4/HBr of 7/15 sccm, a pressure of 100 mTorr and with dc bias of 80 V, an etch rate of InGaAs and InAlAs as high as 100 nm/min at room temperature was achieved with good surface morphology. The addition of SiF4 suppresses the etching of InAlAs and the selectivity obtained can be changed by varying the proportion of SiF4. At a flow rate ratio (SiCl4:SiF4:HBr) of 5/6/20 sccm, dc bias of ≤70 V and a pressure of 150 mTorr, the selectivity obtained is extraordinarily high ((approximately-greater-than)600:1) for this material system. © 1995 American Institute of Physics.
    Type of Medium: Electronic Resource
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