Electronic Resource
Bradford
:
Emerald
Circuit world
24 (1998), S. 34-37
ISSN:
0305-6120
Source:
Emerald Fulltext Archive Database 1994-2005
Topics:
Electrical Engineering, Measurement and Control Technology
Notes:
Reviews the use and development of dry film photoresists and liquid resists. Provides an historical perspective and considers factors affecting investment in the future. Discusses both the advantages and limitations of dry film and liquid photoresists. Provides an outlook for future developments.
Type of Medium:
Electronic Resource
URL:
http://dx.doi.org/10.1108/03056129810198197
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