ISSN:
1013-9826
Source:
Scientific.Net: Materials Science & Technology / Trans Tech Publications Archiv 1984-2008
Topics:
Mechanical Engineering, Materials Science, Production Engineering, Mining and Metallurgy, Traffic Engineering, Precision Mechanics
Notes:
A liquid source misted chemical vapor deposition (LSMCVD) system was used to deposit SrBi2Ta2O9 ferroelectric thin films on Pt/TiO2/SiO2/Si substrates using strontium nitrate, bismuth nitrate and fluorine tantalum acid as the starting ingredients. Citric acid, ethylene glycol, and ethylenediaminetetraaccticacid were employed as chelating agents to form homogeneous and stable sol. A density, homogenous, crack-free and c-axis oriented SrBi2Ta2O9 thin films were prepared successfully and the resultant thin film exhibits the ferroelectric properties of 2Pr of 3.8 C/cm2, 2Ec of 60kV/cm at ±3.5 V,respectively
Type of Medium:
Electronic Resource
URL:
http://www.tib-hannover.de/fulltexts/2011/0528/01/49/transtech_doi~10.4028%252Fwww.scientific.net%252FKEM.280-283.853.pdf
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