Digitale Medien
Woodbury, NY
:
American Institute of Physics (AIP)
Applied Physics Letters
64 (1994), S. 3401-3403
ISSN:
1077-3118
Quelle:
AIP Digital Archive
Thema:
Physik
Notizen:
A plasma-enhanced chemical vapor deposition process by means of the so-called running discharge has been developed. Amorphous hydrogenated carbon (C:H) films were deposited over a length of 2.5 m on the inner wall of an assembled waveguide system. The average deposition rate from a running discharge in methane was 0.27 A(ring)/s. An increase of the average deposition rate to 2.6 A(ring)/s was achieved using acetylene as process gas, while the H/C ratio in the C:H films remains nearly constant at one. The breakdown of a discharge in the metallic waveguide has been studied in argon plasmas depending on magnetic field, microwave power, and gas pressure. A sharp transition between a magnetically enhanced localized discharge and a running discharge was observed at increasing pressure in the range of some Pascal at a microwave power of 100 W. The running velocity (∼104 m/s) of the plasma package increases with increasing microwave power and increasing gas pressure. This plasma behavior has been further investigated by means of the power balance and plasma modeling in methane.
Materialart:
Digitale Medien
URL:
http://dx.doi.org/10.1063/1.111291
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