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  • 1
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    An anti-reflection coating for use with PMMA at 193 nm (1992)
    In:  Other Sources
    Details
    Publication Date: 2019-07-12
    Description: An antireflection coating (ARC) for use with poly(methyl methacrylate) (PMMA) resist for ArF excimer laser lithography (193 nm) was formulated. It consists of PMMA and a bis-azide, 4.4-prime-diazidodiphenyl sulfone (DDS) which crosslinks the film after deep UV (260 nm) irradiation and subsequent annealing. The reacted DDS then serves as the absorber for the 193 nm radiation and also prevents mixing of the ARC and PMMA during PMMA spin-coating and development. The effectiveness of the ARC was demonstrated by exposing, in PMMA, using achromatic holographic lithography, gratings of 100 nm period (about 50 nm linewidth) that are almost entirely free of an orthogonal standing wave.
    Keywords: OPTICS
    Type: Electrochemical Society, Journal (ISSN 0013-4651); 139; 616-619
    Format: text
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    NASA TECHNICAL REPORTS
  • 2
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    Proportional counter windows for the Bragg Crystal Spectrometer on AXAF (1991)
    In:  Other Sources
    Details
    Publication Date: 2019-08-27
    Description: A Bragg Crystal Spectrometer (BCS) using a gas flow proportional counter as its primary detector is among the instruments under development for AXAF. The BCS will employ windows of 1-micron-thick polyimide coated on both sides with 200 A of Al; this window composition, while X-ray transmitting, will leak gas at a lower rate than the polypropylene film-based windows formerly employed. Accounts are given of the results obtained with additional innovative X-ray window materials currently under development, including diamond and Si-enriched Si3N4.
    Keywords: OPTICS
    Type: In: EUV, X-ray, and gamma-ray instrumentation for astronomy II; Proceedings of the Meeting, San Diego, CA, July 24-26, 1991 (A93-34376 13-35); p. 408-419.
    Format: text
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    NASA TECHNICAL REPORTS
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