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  • 1
    ISSN: 1573-5060
    Keywords: common wheat ; Triticum aestivum ; resistance genes ; Erysiphe graminis tritici ; powdery mildew ; monosomic analysis ; allelism tests
    Source: Springer Online Journal Archives 1860-2000
    Topics: Agriculture, Forestry, Horticulture, Fishery, Domestic Science, Nutrition
    Notes: Summary Several wheat cultivars/lines were inoculated with isolates of Erysiphe graminis tritici to identify new genes/alleles for resistance. The wheats were tested with 13 isolates that had been characterized from responses on differential lines with known resistance genes. Gene Mlk which occurs in cultivars ‘Kolibri’, ‘Syros’, ‘Ralle’ and several other European common wheats was found to be an allele at the Pm3 locus and is now designated Pm3d. The mildew resistance in an old Australian wheat, ‘W150’, is conferred by a single gene also allelic to Pm3 and now designated Pm3e. The near-isogenic line ‘Michigan Amber/8*Cc’ possesses another allele now designated Pm3f. A Syrian land variety of common wheat shows mildew resistance that is conditioned by the combination of genes Pm1 and Pm3a. Finally, two accessions of Triticum aestivum ssp. sphaerococcum appeared to possess the Pm3c allele.
    Type of Medium: Electronic Resource
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  • 2
    ISSN: 0003-3146
    Keywords: Chemistry ; Polymer and Materials Science
    Source: Wiley InterScience Backfile Collection 1832-2000
    Topics: Chemistry and Pharmacology , Physics
    Notes: We show how narrow spectral holes burnt into the inhomogeneous absorption of dye doped polymers can be used as extremely sensitive detectors for measuring structural rearrangement processes. A model is suggested which relates the observed hole burning phenomena to the specific heat of the conformation phase space.
    Additional Material: 5 Ill.
    Type of Medium: Electronic Resource
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  • 3
    Electronic Resource
    Electronic Resource
    Weinheim : Wiley-Blackwell
    Acta Polymerica 41 (1990), S. 553-554 
    ISSN: 0323-7648
    Keywords: Chemistry ; Polymer and Materials Science
    Source: Wiley InterScience Backfile Collection 1832-2000
    Topics: Chemistry and Pharmacology , Physics
    Additional Material: 2 Ill.
    Type of Medium: Electronic Resource
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  • 4
    Electronic Resource
    Electronic Resource
    Weinheim : Wiley-Blackwell
    Acta Polymerica 42 (1991), S. 51-52 
    ISSN: 0323-7648
    Keywords: Chemistry ; Polymer and Materials Science
    Source: Wiley InterScience Backfile Collection 1832-2000
    Topics: Chemistry and Pharmacology , Physics
    Additional Material: 3 Ill.
    Type of Medium: Electronic Resource
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  • 5
    ISSN: 0323-7648
    Keywords: Chemistry ; Polymer and Materials Science
    Source: Wiley InterScience Backfile Collection 1832-2000
    Topics: Chemistry and Pharmacology , Physics
    Description / Table of Contents: Two different hypotheses of the phenomenological process of etching of polymer films in a non isothermal oxygen plasma of a high frequency discharge are discussed: the successive etching on the surface and the formation of an etch-resistant surface layer with a shifting of the degradation processes in polymer bulk. This second model proposed by Valiev requires a complicated system of diffusion processes of plasma species and degradation products. Our findings are in contrast to those of Valiev, but it seems that the plasma modified surface layer plays a dominant role within the ablation process.
    Notes: Zwei unterschiedliche Vorstellungen zum Ablauf des Abtrags von Polymerschichten in einem nichtisothermen Sauerstoffplasma einer elektrischen Hochfrequenzentladung werden diskutiert: der successive Abbau an der Oberfläche und die plasmaphysikalische Verfestigung der Polymeroberfläche bei gleichzeitiger Verlagerung des Abbaus in des Polymervolumen. Das letztgenannte Modell von Valiev verlangt komplizierte Diffusionsprozesse von abbaufähigen Plasmaspezies und entsprechenden Abbauprodukten. Die hier durchgeführten Modellversuche sprechen in ihren Ergebnissen gegen das Modell von Valiey, wobei jedoch die plasmamodifizierte Polymeroberflächenschicht tatsächlich eine besondere Rolle beim Abbau der gesamten Polymerschicht spielt.
    Additional Material: 3 Ill.
    Type of Medium: Electronic Resource
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  • 6
    ISSN: 0323-7648
    Keywords: Chemistry ; Polymer and Materials Science
    Source: Wiley InterScience Backfile Collection 1832-2000
    Topics: Chemistry and Pharmacology , Physics
    Description / Table of Contents: The investigation of the temperature dependence of polymer etching rates in an oxygen plasma was extented to some more polymers. The complex nature of the etching process becomes obvious, because the temperature dependences are often nonlinear. Characteristic changes in the slope of the curves correspond only in some cases with the glass temperature of the polymers. Therefore these points can also be connected with the formation and etching of adsorption layers. Activation energies of partial processes were determined. Based on the temperature dependence, only some general conclusions on the plasma etching mechanism could be derived.
    Notes: Die Untersuchung von Temperaturabhängigkeiten der Plasmaätzrate von Polymeren im Sauerstoffplasma wurde auf weitere Polymere ausgedehnt. Die Temperaturabhängigkeit der Plasmaätzrate ist teilweise sehr unterschiedlich, was auf einen sehr komplexen Mechanismus des Ätzprozesses hindeutet. Charakteristische Knickpunkte in den Kurven konnten nur in einigen Fällen mit der Glastemperatur des Polymers in Verbindung gebracht werden. Möglicherweise werden diese Knickpunkte auch durch Abtrag und Bildung von Adsorptionsschichten hervorgerufen. Aktivierungsenergien von Teilprozessen wurden bestimmt. Aus den Temperaturabhängigkeiten allein ließen sich nur allgemeine Schlußfolgerungen über den Mechanismus des Plasmaätzens der einzelnen Polymere ableiten.
    Additional Material: 4 Ill.
    Type of Medium: Electronic Resource
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