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  • 1
    Electronic Resource
    Electronic Resource
    Springer
    Applied physics 44 (1987), S. 171-175 
    ISSN: 1432-0630
    Keywords: 81.15 Gh ; 52.90 + z ; 68.55 + b
    Source: Springer Online Journal Archives 1860-2000
    Topics: Mechanical Engineering, Materials Science, Production Engineering, Mining and Metallurgy, Traffic Engineering, Precision Mechanics , Physics
    Notes: Abstract ThemetalorganicplasmaenhancedChemicalVapourDeposition (MOPECVD) of gold films at room temperature using dimethyl(2,4-pentane-dionato)gold(III) as starting material is reported. By adding oxygen or propene to the rf glow discharge, films of Au oxide and of a composite gold polymer, respectively, were obtained.
    Type of Medium: Electronic Resource
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  • 2
    Electronic Resource
    Electronic Resource
    Springer
    Applied physics 47 (1988), S. 199-203 
    ISSN: 1432-0630
    Keywords: 81.15 Gh ; 52.90+z ; 68.55+b
    Source: Springer Online Journal Archives 1860-2000
    Topics: Mechanical Engineering, Materials Science, Production Engineering, Mining and Metallurgy, Traffic Engineering, Precision Mechanics , Physics
    Notes: Abstract The adhesion of copper to PTFE has been studied with regard to the influence of a pretreatment in discharges of reactive gases, such as O2 and CF4/O2, and a subsequent deposition of thin metallic interlayers of Pd, Pt, Au, and Cu by PECVD methods. Adhesion forces could be enhanced by about the factor of 10 compared with merely pretreated surfaces up to 5 N/mm, which, as scanning electron micrographs prove, corresponds to the tensile strength of the bulk material. SIMS spectra of the back surface of a peeled copper stripe show the typical signals of PTFE. The thermal stability of the layers was established by dipping the samples into a tin bath of 540 K. The enhanced adhesion is not only due to the changes in surface morphology by etching. It can be attributed to chemical effects, i. e. chemical bonds between substrate atoms and the interlayer, and physical effects, caused by implantation of metal ions into the upper surface layers accompanied by a probable electron transfer from PTFE to metal.
    Type of Medium: Electronic Resource
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  • 3
    Electronic Resource
    Electronic Resource
    Springer
    Applied physics 48 (1989), S. 373-375 
    ISSN: 1432-0630
    Keywords: 81.15Gh ; 52.90+z ; 68.55+b
    Source: Springer Online Journal Archives 1860-2000
    Topics: Mechanical Engineering, Materials Science, Production Engineering, Mining and Metallurgy, Traffic Engineering, Precision Mechanics , Physics
    Notes: Abstract Thin films of rhodium have been prepared starting from dicarbonyl-2.4-pentadionato-rhodium(I), Rh(CO)2C5H7O2, by plasma enhanced CVD. The dependence of the deposition rate and film properties on substrate temperature, partial pressure of the organometallic and on hydrogen has been studied. Metal contents of ≈ 100% and thin-film resistivities as low as 5 times the bulk resistivity of rhodium have been achieved.
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  • 4
    Electronic Resource
    Electronic Resource
    Springer
    Applied physics 49 (1989), S. 691-696 
    ISSN: 1432-0630
    Keywords: 81.15Gh ; 52.90+z ; 68.55+b
    Source: Springer Online Journal Archives 1860-2000
    Topics: Mechanical Engineering, Materials Science, Production Engineering, Mining and Metallurgy, Traffic Engineering, Precision Mechanics , Physics
    Notes: Abstract Plasma-enhanced chemical vapour deposition of silver films has been performed using perfluoro-1-methylpropenylsilver as a precursor. Under most conditions of rf power, substrate temperature and gas composition shiny films with resistivities of ≦2 μω cm and impurities of ≦1 % are obtained.
    Type of Medium: Electronic Resource
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  • 5
    Electronic Resource
    Electronic Resource
    Springer
    Plasma chemistry and plasma processing 8 (1988), S. 9-17 
    ISSN: 1572-8986
    Keywords: Plasma deposition ; thin films ; organometallics
    Source: Springer Online Journal Archives 1860-2000
    Topics: Chemistry and Pharmacology , Mechanical Engineering, Materials Science, Production Engineering, Mining and Metallurgy, Traffic Engineering, Precision Mechanics , Technology
    Notes: Abstract The plasma treatment of vapors containing organometallic compounds (of Pd, Ni, Co, Sn, Au) and various alkenes has been used to prepare thin films, the composition and electrical resistivity of which could be varied over a wide range.
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  • 6
    Electronic Resource
    Electronic Resource
    Springer
    Plasma chemistry and plasma processing 8 (1988), S. 67-74 
    ISSN: 1572-8986
    Keywords: Plasma oxidation ; olefins ; organic plasma chemistry
    Source: Springer Online Journal Archives 1860-2000
    Topics: Chemistry and Pharmacology , Mechanical Engineering, Materials Science, Production Engineering, Mining and Metallurgy, Traffic Engineering, Precision Mechanics , Technology
    Notes: Abstract The oxidation ofn-octene has been studied in mixtures with dimethylbutane, 1,4-dimethylcyclohexane, ethylcyclohexane, and dibutyl ether. Except for dimethylbutane, total yields increase on addition of a solvent, and the fraction of epoxide among the products is higher than in reactions with neat octene.
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  • 7
    Electronic Resource
    Electronic Resource
    Springer
    Plasma chemistry and plasma processing 9 (1989), S. 7S 
    ISSN: 1572-8986
    Keywords: Nonequilibrium ; organic compounds ; organometallic
    Source: Springer Online Journal Archives 1860-2000
    Topics: Chemistry and Pharmacology , Mechanical Engineering, Materials Science, Production Engineering, Mining and Metallurgy, Traffic Engineering, Precision Mechanics , Technology
    Notes: Abstract The possibilities and limitations of available apparatus for nonequilibrium discharges are discussed. Especially for synthetic work there is a lack of suitable equipment. The unique possibilities which plasmas offer to chemistry are demonstrated by examples from the homogeneous gas phase, and from plasma liquid and plasma solid interactions. Various applications and major trends are being described. The most rapidly increasing field of plasma chemistry is presently the formation of thin films of metals, oxides, carbides, or nitrides by plasma enhanced CVD. The latest results, and especially the use of organometallic compounds and starting material, are being discussed.
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  • 8
    Electronic Resource
    Electronic Resource
    Springer
    Plasma chemistry and plasma processing 9 (1989), S. 217-223 
    ISSN: 1572-8986
    Keywords: Chemical vapor deposition (CVD) ; organometallics ; alloys
    Source: Springer Online Journal Archives 1860-2000
    Topics: Chemistry and Pharmacology , Mechanical Engineering, Materials Science, Production Engineering, Mining and Metallurgy, Traffic Engineering, Precision Mechanics , Technology
    Notes: Abstract Three different techniques for the deposition of thin metal alloy films by plasma-enhanced chemical vapor deposition are described. These are the joint vaporization of a mixture of precursors, the use of separate sources connected directly to the reactor, and finally, the use of several reservoirs arranged in series. Various organometallics have been used as precursors to prepare combinations of Fe/Co and Au/Pt/Pd.
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  • 9
    Electronic Resource
    Electronic Resource
    Springer
    Reaction kinetics and catalysis letters 34 (1987), S. 167-172 
    ISSN: 1588-2837
    Source: Springer Online Journal Archives 1860-2000
    Topics: Chemistry and Pharmacology
    Description / Table of Contents: Abstract Заглавное соединение подвергали пиролизу в проточной системе с перемешиванием в интервале температур 340–402°C и при давлениях 2–12 торр. Каждый сульфид реагирует по двум неэквивалентным маршрутам, давая в качестве продуктов олефины и тиоальдегиды. Аррениусовские параметры согласны с мономолекулярным механизмом, включающим в себя шестицентровое циклическое промежуточное соединение.
    Notes: Abstract The title compounds were pyrolyzed in a stirred-flow system over the temperature range of 340–402°C and pressures between 2 and 12 Torr. For each sulfide, two nonequivalent reaction paths are available, yielding olefins plus thioaldehydes as products. The Arrhenius parameters are consistent with unimolecular mechanisms involving six-centered cyclic transition states.
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  • 10
    Publication Date: 1988-02-01
    Print ISSN: 0040-6090
    Electronic ISSN: 1879-2731
    Topics: Physics
    Published by Elsevier
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