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  • 1
    ISSN: 0044-2313
    Keywords: Organosilicon compounds ; Cu-catalyzed reaction of silicon with bis(trichlorsilyl)dichlormethane and related compounds ; formation of Si-chlorinated trisila- and tetrasilamethanes, 2,4 disilacyclobutanes and C-spiro-linked Disilacyclopropanes ; crystal structure of 1,1,3,3-Tetrachlor-2,2,4,4-tetrakis(trichlorsilyl)- 1,3-disilacyclobutane (Si6C2Cl16) and 1,1,3,3,5,5,7,7-octachlor-2,2,6,6-tetrakis(trichlorsilyl)-1,3,5,7-tetrasilaspiro [3.3]-heptane (Si8C3Cl20) ; Chemistry ; Inorganic Chemistry
    Source: Wiley InterScience Backfile Collection 1832-2000
    Topics: Chemistry and Pharmacology
    Description / Table of Contents: Formation of Organosilicon Compounds. 110. Reactions of (Cl3Si)2CCl2 and its Si-methylated Derivatives as well as of (Cl3Si)2CHCl, (Cl3Si)2C(Cl)Me and Me2CCl2 with Silicon (Cu cat.)The reactions of (Cl3Si)2CCl2 1, its Si-methylated derivatives (Me3Si)2CCl2 8, Me3Si—CCl2—SiMe2Cl 9, (ClMe2Si)2CCl2 10, Me3Si—CCl2—SiMeCl2 11, Cl2MeSi—CCl2—SiCl3 12 as well as of (Cl3Si)2CHCl 38, (Cl3Si)2CClMe 39 and of Me2CCl2 with Si (Cu cat.) in a fluid bed reactor (38 and 39 also in a stirred solid bedreactor) arc presented. While (Cl3Si)2CCl21yields C(SiCl3)4 2 the 1,1,3,3-tetrachloro-2,2,4,4-tetrakis(trichlorsilyl)-1,3-disilacyclobutane Si6C2Cl16 3 and the related C-spiro linked disilacyclobutanes Si8C3Cl20 4, Si10C4Cl24 5, Si12C5Cl28 6, Si14C6Cl32 7this type of compounds is not obtained starting from the Si-methylated derivatives 8, 9, 10, 11They Produce a number of variously Si-chlorinated and -methylated tetrasila- and trisilamethanes. However, Cl2MeSi—CCl2—SiCl3 12forms besides of Si-chlorinated trisilamethanes also the disilacyclobutanes Si6C2Cl15Me 34and cis- and trans Si6C2Cl14Me2 35 as well as the spiro-linked disilacyclobutanes Si8C3Cl19Me 36, Si8C3Cl18Me2 37. (Cl3Si)2CHCl 38 mainly yields HC(SiCl3)3 31and also the disilacyclobutanes cis- and trans-(Cl3Si)HC(SiCl2)2CH(SiCl3) 41and (Cl3Si)2C(SiCl2)2CH(SiCl3) 45the 1,3,5-trisilacyclohexane [Cl3Si(H)C—SiCl2]3 44 as well as [(Cl3Si)2CH]2SiCl2, and (Cl3Si)2CClMe 39 mainly yields (Cl3Si)2C=CH2and (Cl3Si)2besides of HC(SiCl3)3, MeC(SiCl3)3and (Cl3Si)3C—SiCl2Me.,. Me2CCl2 59 mainly yields Me(Cl)C=CH2, Me2CHCl and HCl2Si—CMe2—SiCl3, besides of Me2C(SiCl3)2 and Me2C(SiCl2H)2 Compound 3 crystallizes triclinically in the space group P1 (Nr. 2) mit a = 900,3, b = 914,0, c = 855,3 pm, α = 116,45°, β = 101,44°, γ = 95,86° and one molecule per unit cell. Compound 4 crystallizes monoclinically in thc space group C2/c (no. 15) with a = 3158.3,b = I 103.7, c = 2037.4 pm, β = 1 16.62° and 8 molecules pcr unit cell. The disilacyclobutane ring of compound 3 is plane, showing a mean distance of d(Si-C) =19 1.8 pm and the usual deformations of endocyclic angles: αSi = 94,2°〉 85,8° = αC.The spiro-linked disilacyclobutane rings of compound4 are slightly folded by a mean angle of (19.0°). Their mean distances were found to be d(Si—C) = 190.4 pm relating to the central carbon atom and 192.0 pm to the outer ones, respectively. The deformations of endocyclic angles: αSi = 93,9°〉 84,4° = αC are comparable to those of compound 3.
    Notes: Es wird über die Umsetzungen von (Cl3Si)2CCl2 1, seiner Si-methylierten Derivate (Me3Si)2CCl2 8, Me3Si—CCl2—SiMe2Cl 9, (ClMe2Si)2CCl2 10, Me3Si—CCl2—SiMeCl2 11, Cl2MeSi—CCl2—SiCl3 12 sowie von (Cl3Si)2CHCl 38, (Cl3Si)2CClMe 39 und Me2CCl2 mit Silicium (Cu-Kat.) in der Wirbelschicht bei 300°C - von 38 und 39 auch im Festbett - berichtet. Während die Umsetzung von (Cl3Si)2CCl2 zu C(SiCl3)4 2, dem 1,1,3,3-Tetrachlor-2,2,4,4-tetrakis(trichlorsilyl)-1,3-disilacyclobutan Si6C2Cl16 3 und den C-spiro-verbrückten Disilacyclobutanen Si8C3Cl20 4, Si10C4Cl24 5, Si12C5Cl28 6, Si14C6Cl32 7 führen, wird dieser Verbindungstyp von den Si-methylierten Verbindungen 8, 9, 10, 11 nicht gebildet. Ihre Umsetzungen führen zu unterschiedlich Si-chlorierten-methylierten Tetrasila- bzw. Trisilamethanen. Dagegen bildet das Cl2MeSi—CCl2—SiCl3 12 neben Si-chlorierten Trisilamethanen die Disilacyclobutane Si6C2Cl15Me 34, Si6C2Cl14Me2 35 (cis- und trans), 4 und Si8C3Cl19Me 36, Si8C3Cl18Me2 37. (Cl3Si)2CHCl 38 bildet HC(SiCl3)3 31 (Hauptprodukt), und es entstehen die Disilacyclobutane (Cl3Si)HC(SiCl2)2CH(SiCl3) 41 (cis, trans), (Cl3Si)2C(SiCl2)2CH(SiCl3) 45, das 1,3,5-Trisilacyclohexan [Cl3Si(H)C—SiCl2]3 44 sowie (Cl3Si)2CH—CH(SiCl3)2 und [(Cl3Si)2CH]2SiCl2. Aus (Cl3Si)2CClMe 39 bilden sich bevorzugt (Cl3Si)2C=CH2 und (Cl3Si)2CHMe neben HC(SiCl3)3, MeC(SiCl3)3 und (Cl3Si)3C—SiCl2Me. Aus Me2CCl2 59 entstehen bevorzugt Me(Cl)C=CH2, Me2CHCl sowie HCl2Si—CMe2—SiCl3 neben Me2C(SiCl3)2 und Me2C(SiCl2H)2. Verbindung 3 kristallisiert triklin in der Raumgruppe P1 (Nr. 2) mit a = 900,3, b = 914,0, c = 855,3 pm, α = 116,45°, β = 101,44°, γ = 95,86° und mit einem Molekül Pro Elementarzelle; 4: monoklin in der Raumgruppe C2/c (Nr. 15) mit a = 3 158,3, b = 1 103,7, c = 2 037,4 pm, β = 116,62° und mit 8 Molekülen pro Elementarzelle. In 3 ist der Disilacyclobutanring planar mit d(Si—C) = 191,8 pm und der üblichen Deformation in den endocyclischen Winkeln αSi = 94,2°〉 85,8° = αC. Im Bicyclus 4 sind die beiden spiroverknüpften Disilacyclobutanringe leicht gefaltet (19,0°) mit d(Si—C) = 190,4 pm am Spiro-C-Atom und d(Si—C) = 192,0 pm an den beiden anderen. Auch in 4 gilt für die endocyclischen Winkel αSi = 93,9° 〉 84,4° = αC.
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  • 2
    Electronic Resource
    Electronic Resource
    Weinheim : Wiley-Blackwell
    Zeitschrift für anorganische Chemie 616 (1992), S. 39-45 
    ISSN: 0044-2313
    Keywords: Organosilicon compounds ; amino-substituted disilanes ; thermally induced reaction mechanisms ; Chemistry ; Inorganic Chemistry
    Source: Wiley InterScience Backfile Collection 1832-2000
    Topics: Chemistry and Pharmacology
    Description / Table of Contents: Formation of Organosilicon Compounds. 108 [1]. Thermally Induced Reactions of Amino-Substituted DisilanesThermally induced reactions of amino-substituted disilanes yield Si rich silanes. At 300°C, Me3Si—SiMe2—NMeH 1 yields Me3Si—NMeH 2 and Me3Si—(SiMe2)2-NMeH 3 in a ratio 1 : 2 : 3 = 1,6 : 1 : 1, whereas Me3Si—SiMe2—N(iPr)H 4 at 350°C yields Me3Si—N(iPr)H 5, Me3Si—(SiMe2)2-N(iPr)H 6 and Me3Si—(SiMe2)3—N(iPr)H 7 in a ratio of 4 : 6 : 7 = 0.8 : 1.0 : 0.6. Me3Si—SiMe2—NMe2 8 at 300°C (72 h) yields Me3Si—NMe2 9 and Me3Si-(SiMe2)2-NMe2 10 in a ratio of 9 : 8 : 10 = 1 : 0.22 : 0.44 The thermal stability of these disilanes is determined by the sterical requirements of the amino substituents NMeH 〈 NMe2 〈 N(iPr)H. The introduction of a second NMe2 group decreases the stability and favours the formation of Si rich silanes. Such, Me2N—(SiMe2)2—NMe2 11 already at 250°C (2 h) yields Me2N—SiMe2—NMe2 12, Me2N—(SiMe2)2—NMe2 13 and Me2N—(SiMe2)4—NMe2 14 in a ratio of 11 : 13 : 14 = 0.3 : 0.9 : 1.0.The reactions can be understood as insertions of thermally produced dimethylsilylene into the Si—N bond of the disilanes. This process is strongly favoured as compared to the trapping reactions with Ph—C≡C—Ph or Et3SiH. The mentioned reactions correspond closely to those of the methoxy-disilanes[2].However (MeN—SiMe2—SiMe2)2 15, obtained from HMeN—(SiMe2)2—NMeH by condensation [3], at 400°C suffers a ring contraction to octymethyl-1,3-diaza-2,4,5-trisilacyclopentane (69 weight %), and yields also some solid residue, the composition of which corresponds to Si3C7NH21.
    Notes: Thermisch induzierte Reaktionen amino-substituierter Disilane führen zur Bildung Si-reicherer Silane. Aus Me3Si—SiMe2—NMeH 1 bilden sich bei 300°C Me3Si—NMeH 2, Me3Si—(SiMe2)2—NMeH 3 im Verhältnis 1 : 2 : 3 = 1,6 : 1 : 1, aus Me3Si—SiMe2—N(iPr)H 4 bei 350°C Me3Si—N(iPr)H 5, Me3Si—(SiMe2)2-N(iPr)H 6, Me3Si—(SiMe2)3—N(iPr)H 7 im Verhältnis 4 : 6 : 7 = 0,8 : 1,0 : 0,6, aus Me3Si—SiMe2—NMe2 8 bei 300°C (72 h), Me3Si—NMe2 9 und Me3Si(SiMe2)2—NMe2, 10 im Verhältnis 9 : 8 : 10 = 1 : 0,22 : 0,44. Die thermische Stabilität der Disilane wird durch den Raumbedarf der Aminosubstituenten beeinflußt, NMeH 〈 NMe2 〈 N(iPr)H. Die Einführung einer zweiten NMe2-Gruppe führt zu einem Stabilitätsverlust und begünstigt die Bildung Si-reicherer Silane. So reagiert Me2N—(SiMe2)2—NMe2 11 bereits bei 250°C (2 h) zu Me2N—SiMe2-NMe2 12, Me2N—(SiMe2)3-NMe2 13 und Me2N—(SiMe2)4-NMe2 14 im Verhältnis 11 : 13 : 14 = 0,3 : 0,9 : l,0.Die Reaktionen lassen sich durch die thermische Bildung von Dimethylsilylen deuten, das unter Einschub in die Si—N-;Bindung des Disilans weiterreagiert. Dieser Vorgang ist gegenüber Abfangreaktionen mit Ph—C≡C—Ph und Et3SiH stark begünstigt. Die beschriebenen Reaktionen entsprechen dem Verhalten der Methoxydisilane [2].Das (MeN—SiMe2—SiMe2)2 15 (gebildet aus HMeN(SiMe2)2NMeH durch Kondensation [3]) reagiert bei 400°C unter Ringverengung zum Octamethyl-l,3-diaza-2,4,5-trisilacyclopentan 17 (69 Gew.%) und Bildung eines Rückstandes der Zusammensetzung Si3C7NH21.
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