ISSN:
1573-482X
Source:
Springer Online Journal Archives 1860-2000
Topics:
Electrical Engineering, Measurement and Control Technology
,
Mechanical Engineering, Materials Science, Production Engineering, Mining and Metallurgy, Traffic Engineering, Precision Mechanics
Notes:
Abstract The dependence of the magnetic properties, especially magnetoresistivity, of sputtered permalloy thin films on the sputtering Ar pressure is studied. The Ar pressure is varied between 0.106 and 1.06 pa. The coercivity and the electrical resistivity of permalloy films both remain stable in this pressure range. These two properties are dependent on the grain size of a permalloy film, which is independent of the Ar pressure in this pressure range. The average grain size is 10–12 nm in diameter. The magnetoresistivity δϱ decreases and the anisotropy field increases as the Ar pressure decreases. Magnetoresistivity is related to the preferred orientation of the sputtered permalloy film. The permalloy films deposited at high Ar pressures have no preferred orientation; therefore, they show high magnetoresistivity.
Type of Medium:
Electronic Resource
URL:
http://dx.doi.org/10.1007/BF00180786
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