ISSN:
1573-2711
Schlagwort(e):
carbon nitride
;
sputter-deposition
;
stress
;
hardness
Quelle:
Springer Online Journal Archives 1860-2000
Thema:
Maschinenbau
Notizen:
Abstract Nanoindentation hardness and compressive stress in amorphous carbon nitride thin films prepared by unbalanced magnetron sputter-deposition were studied. The coating hardness and compressive stress were found to be strongly dependent on processing parameters such as substrate bias and nitrogen partial pressure. Under optimized deposition conditions, carbon nitride thin films with nanoindentation hardness about 25 GPa have been coated onto Si wafers and M2 steels. A strong correlation between coating hardness and compressive stress in the coating was observed.
Materialart:
Digitale Medien
URL:
http://dx.doi.org/10.1007/BF00157978
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