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  • 1
    ISSN: 1432-0630
    Keywords: PACS: 81.15.Gh; 52.90.+z; 68.55.+b
    Source: Springer Online Journal Archives 1860-2000
    Topics: Mechanical Engineering, Materials Science, Production Engineering, Mining and Metallurgy, Traffic Engineering, Precision Mechanics , Physics
    Notes: Abstract. Thin films of hafnium carbide have been deposited by plasma-enhanced chemical vapor deposition using bis(η-cyclopentadienyl)dimethylhafnium, Cp2Hf(CH3)2, as precursor in 13.56 MHz planar reactor. The influence of the various experimental parameters on film properties has been studied. The carbon content ranged from 11 to 40 weight% and increased with the deposition rate. The film hardness varied between 1300 and 2000 HK. Depending on the carbon content and power delivered in the discharge, the film resistivity and film density ranged from 271 to 105 µΩ⋅cm and from 3.4 to 10.4 g/cm3, respectively, and the film composition varied from HfC to hafnium containing a-C:H films.
    Type of Medium: Electronic Resource
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  • 2
    Electronic Resource
    Electronic Resource
    Springer
    The European physical journal 313 (1983), S. 147-150 
    ISSN: 1434-601X
    Source: Springer Online Journal Archives 1860-2000
    Topics: Physics
    Notes: Abstract The hyperfine structure (hfs) interaction between the metastable 23 S 1 and 21 S 0 states in6, 7Li+ causes very small equal and opposite energy level shifts,δ, in the two levels having the same total angular momentum quantum numberF=I. This amounts to 12ppm with respect to the total hfs splitting of 30 GHz for the7Li+ 23S1 state and has been measured for the first time directly for the case of a core-free electronic system by combined laser-microwave spectroscopy. A new calculation ofδ with accurate integral-transform 21 S 0 and 23S1 wave functions is reported. Configuration interactions and electron exchange and correlation effects, which differ for parallel (3 S 1) and antiparallel (1 S 0) spins, are treated in detail in order to obtain very good agreement between measured and theoretical values for this tiny perturbation. A complete understanding ofδ is indispensable for extracting fundamental constants from two-electron spectroscopic data.
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  • 3
    ISSN: 1432-0649
    Keywords: 42.65 ; 07.65
    Source: Springer Online Journal Archives 1860-2000
    Topics: Physics
    Type of Medium: Electronic Resource
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  • 4
    ISSN: 1432-0630
    Keywords: 81.15.Gh ; 52.90.+z ; 68.55.+b
    Source: Springer Online Journal Archives 1860-2000
    Topics: Mechanical Engineering, Materials Science, Production Engineering, Mining and Metallurgy, Traffic Engineering, Precision Mechanics , Physics
    Notes: Abstract Thin films of hafnium carbide have been deposited by plasma-enhanced chemical vapor deposition using bis(η-cyclopentadienyl)dimethylhafnium, Cp2 Hf(CH3)2, as precursor in 13.56 MHz planar reactor. The influence of the various experimental parameters on film properties has been studied. The carbon content ranged from 11 to 40 weight % and increased with the deposition rate. The film hardness varied between 1300 and 2000 HK. Depending on the carbon content and power delivered in the discharge, the film resistivity and film density ranged from 271 to 105 μΩ·cm and from 3.4 to 10.4 g/cm3, respectively, and the film composition varied from HfC to hafnium containing a-C: H films.
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  • 5
    ISSN: 1434-601X
    Source: Springer Online Journal Archives 1860-2000
    Topics: Physics
    Notes: Abstract The hyperfine structure (hfs) splittings of the metastable 1s2s 3 S 1 state of7Li+ have been measured with combined laser optical pumping and microwave resonance. A lowenergy Li+ ion beam, optically excited by an intersecting laser beam, passed a waveguide where radio frequency transitions were induced. The resulting population transfer among the hfs levels of the3 S 1 was detected via the change in intensity of the fluorescence light from a second crossing region of laser light and ion beam located past the waveguide. The magnetic hfs constantA(7Li+, 1s2s 3S1) was measured and compared with theory. A deviation of the two transition frequenciesν(F=3/2−F=5/2) andν(F=1/2−F=3/2) from the interval rule is due to a depression of theF=3/2 hfs sublevel, caused by mixing of the 23 S 1 and 21 S 0 states via hyperfine interaction. This shift was never observed so far in a two-electron spectrum, because of absence ofI〉1/2 isotopes in He, the only two-electron atom investigated spectroscopically with high precision. The size of the shift is in fair agreement with a theoretical estimate.
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  • 6
    Electronic Resource
    Electronic Resource
    Springer
    Plasma chemistry and plasma processing 19 (1999), S. 241-254 
    ISSN: 1572-8986
    Keywords: Oxidation of liquid olefins ; oxygen cold plasmas ; O(3P)
    Source: Springer Online Journal Archives 1860-2000
    Topics: Chemistry and Pharmacology , Mechanical Engineering, Materials Science, Production Engineering, Mining and Metallurgy, Traffic Engineering, Precision Mechanics , Technology
    Notes: Abstract The oxidation of 13 liquid olefins with either high-voltage or radio frequency (RF) glow discharges has been studied. The reactions were carried out by making the oxygen plasma reach the low vapor pressure substrate. Product formation has proved to be selective—epoxides, aldehydes, ketones, and low quantities of carboxylic acids being the most important species. Fragmentation products were only observed in the traps of the RF system for the most volatile olefin of this study. This indicates that, except for this case, the most relevant interaction of this study has been the heterogeneous reaction of the plasma with the liquid. Total conversion, i.e., mass transformed against initial mass of substrate, has been studied as a function of temperature of the liquid and oxygen flow rate in the reactor, this ranging from 15 to 53.6 mmol/hr in the high-voltage system and 13 to 270 mmol/hr in the RF device. The optimum conversions were 27 to 99%. A correlation between these results and the behavior of the O( 3 P) population in the discharge allows us to conclude that this is the most relevant species to the oxidation process. A discussion relating the structures of the olefins with the composition of the mixtures produced by the oxidation is also presented.
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  • 7
    Electronic Resource
    Electronic Resource
    Springer
    Plasma chemistry and plasma processing 4 (1984), S. 285-295 
    ISSN: 1572-8986
    Keywords: Plasma oxidation ; liquids ; organic materials
    Source: Springer Online Journal Archives 1860-2000
    Topics: Chemistry and Pharmacology , Mechanical Engineering, Materials Science, Production Engineering, Mining and Metallurgy, Traffic Engineering, Precision Mechanics , Technology
    Notes: Abstract Liquid 2,2,4-trimethylpentane (I), 1-octene (II), and di-n-butylsulfide (III) were subjected to plasma of oxygen. II and III were also treated dissolved in alkanes. Conversion rates increased with decreasing temperature, with increasing gas velocity, and, in the case of II, also with the addition of nitrogen or helium to the gas stream. The selectivity of product formation is far superior to plasma oxidations in the gas phase, making these techniques attractive for preparative chemistry.
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  • 8
    ISSN: 1572-8986
    Keywords: Langmuir probe ; plasma potential ; electron density ; electron energy ; plasma CVD ; rf-discharge
    Source: Springer Online Journal Archives 1860-2000
    Topics: Chemistry and Pharmacology , Mechanical Engineering, Materials Science, Production Engineering, Mining and Metallurgy, Traffic Engineering, Precision Mechanics , Technology
    Notes: Abstract A Langomir probe investigation of Ar/H2/Cp2HfMe2 plasmas is described. The probe measurements were performed for various discharge conditions. The mean electron energy and electron density were measured for various power, gas flows of argon, and hydrogen and precursor concentrations. Addition of the precursor into the discharge resulted in an appreciable decrease in the electron density and an increase in the mean electron energr. Whereas a transition front the a-mode to the γ-mode has been observed with power rise in the Ar/H2 plasmas without precursor, in the presence of the precursor the plasota α-mode remained unchanged in the power range investigated.
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  • 9
    ISSN: 0006-3592
    Keywords: in situ microscopy ; on-line biomass determination ; cell concentration ; depth from focus ; image analysis ; Chemistry ; Biochemistry and Biotechnology
    Source: Wiley InterScience Backfile Collection 1832-2000
    Topics: Biology , Process Engineering, Biotechnology, Nutrition Technology
    Notes: A new technique is presented which allows the use of a front-end sensor head for in situ and on-line characterization of cell concentration and cell size during fermentation. An epifluorescence microscope is mounted in a port of a bioreactor viewing directly into the agitated broth. Still images from cells are generated using pulsed illumination. They are directly visualized on a monitor and used for automatic image analysis. The cell concentration and morphological information are determined by counting and evaluating the cell images with respect to their depth from focus characteristic. An in situ microscope was successfully tested during yeast fermentations and yielded results which correlated well with results from a hemocytometer. © 1995 John Wiley & Sons, Inc.
    Additional Material: 10 Ill.
    Type of Medium: Electronic Resource
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  • 10
    ISSN: 1572-9540
    Source: Springer Online Journal Archives 1860-2000
    Topics: Physics
    Type of Medium: Electronic Resource
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