Abstract
Liquid 2,2,4-trimethylpentane (I), 1-octene (II), and di-n-butylsulfide (III) were subjected to plasma of oxygen. II and III were also treated dissolved in alkanes. Conversion rates increased with decreasing temperature, with increasing gas velocity, and, in the case of II, also with the addition of nitrogen or helium to the gas stream. The selectivity of product formation is far superior to plasma oxidations in the gas phase, making these techniques attractive for preparative chemistry.
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References
H. Suhr,Plasma Chem. Plasma Proc. 3(1), 1 (1983).
M. Hudis, inJ. R. Hollahan andA. T. Bell, Techniques and Applications of Plasma Chemistry, eds., J. Wiley and Sons, New York (1974), Chap. 3, p. 113.
Th. Rummel,Hochspannungsentladungschemie und ihre industrielle Anwendung, R. Oldenbourg und R. Reick, München (1951), Kap. D, S. 262.
A. Hickling and G. R. Newnes,J. Chem. Soc. 368 (1959); 5177, 5186 (1961).
H. J. Pasman, J. C. Vlugter, and C. J. Brenking,Brennstoffchemie 46(6), 241; (9), 41; (11) 14 (1965).
H. Kroepelin, E. Vogel, and H. Pfeiffer,Ber. 68B, 684 (1935).
E. Zadok, B. Slalom, and Y. Mazur,Angew. Chem. 92(12), 1037 (1980).
E. Zadok, D. Amar, and Y. Mazur,J. Am. Chem. Soc. 102, 6369 (1980).
Bell, A. T., inTechniques and Applications of Plasma Chemistry, J. Wiley and Sons, New York (1974), Chap. 1.
M. Capitelli and E. Molinari,Top. Curr. Chem. 90, 59 (1980).
R. J. Cvetanovic,Adv. Photochem. 1, 115 (1963).
R. Weisbeck and D. Hüllstrung,Chem. Ing. Tech. 42, 1302 (1970).
G. Rosskamp, Dissertation, Tübingen (1972).
E. Inous,J. Electrochem. Soc. Jap. 23, 18 (1955).
E. Inoue,Tokyo Kogyo-Daikaku Gakuko Ser. A 2, 51 (1957).
E. Inoue,J. Electrochem. Soc. Jap. 23, 403, 574, 647 (1955).
C. S. Foote, S. Wexler, W. Ando, and R. Higgins,J. Am. Chem. Soc. 90, 975 (1968).
C. S. Foote and J. W. Peters,J. Am. Chem. Soc. 93, 3795 (1971).
H. G. Walter, Dissertation, Tübingen (1983).
J. M. Cook, J. J. Hannon and B. W. Benson,Conf. Proc. Int. Symp. Plasma Chem. 6th 3, 616 (1983).
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Suhr, H., Schmid, H., Pfeundschuh, H. et al. Plasma oxidation of liquids. Plasma Chem Plasma Process 4, 285–295 (1984). https://doi.org/10.1007/BF00568982
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DOI: https://doi.org/10.1007/BF00568982