ISSN:
1662-9752
Source:
Scientific.Net: Materials Science & Technology / Trans Tech Publications Archiv 1984-2008
Topics:
Mechanical Engineering, Materials Science, Production Engineering, Mining and Metallurgy, Traffic Engineering, Precision Mechanics
Notes:
The purpose of this study is to examine the effect of crystallite preferred orientation on themechanical strength of TiCN thin films in highly compressive residual stress. TiCN thin films weredeposited by PVD on JIS-SKH55 (AISI M35) steel. The applied substrate bias voltages were set for–50, -80, -100, -120 and –150V. Subsequently, residual stress and crystalline preferred orientation ofthese specimens were investigated by X-ray diffraction methodology. The crystalline preferredorientation in thin films was evaluated by the ODF calculated from pole figures. On the other hand,dynamic hardness test (DH) and scratch test were executed to evaluate the mechanical strength of thinfilms.In our study, it was observed that negative bias voltages had an effect on the preferred orientation. Theorientation density at –120V was the highest of all specimens. In addition, the value of scratch sectionarea at –120V was the largest of all specimens. As a conclusion, the relation between the scratch areaand the negative bias voltages corresponded to the relation between the preferred orientation and thebias voltages
Type of Medium:
Electronic Resource
URL:
http://www.tib-hannover.de/fulltexts/2011/0528/02/13/transtech_doi~10.4028%252Fwww.scientific.net%252FMSF.524-525.729.pdf
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