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  • 1
    Electronic Resource
    Electronic Resource
    [S.l.] : American Institute of Physics (AIP)
    Review of Scientific Instruments 65 (1994), S. 1304-1306 
    ISSN: 1089-7623
    Source: AIP Digital Archive
    Topics: Physics , Electrical Engineering, Measurement and Control Technology
    Notes: High-energy and intense beam current broad beam ion sources have been developed for ion implantation and dynamic recoil mixing at CSSAR. The sources can be operated over beam energy and current ranges of 3–120 keV and 5–70 mA, respectively. For sputter coating of thin films, a series of focusing beam ion sources with different structures has also been developed. The energy and current range from 1–10 keV and 100–350 mA for different applications. For some applications, low-energy (below 100 eV) ion beams are required. CSSAR has developed a 6-cm-diam broad beam ion source. The source can be operated at beam energy 10–70 eV, and the beam current 15–80 mA has been extracted. Typical structures and operational data are given for the sources mentioned above. Recently a new type of broad beam metal ion source (Electron Beam Evaporation Metal Ion Source EBE) is being studied. Ion beams of several kinds of materials such as C, W, Ta, Mo, Cr, Ti, B, Cu, etc. have been extracted from the source. Typical operation conditions and ion yields are given in this paper.
    Type of Medium: Electronic Resource
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  • 2
    Publication Date: 2016-05-28
    Description: This paper proposes a new measurement method of electron density using the reactance spectrum of the plasma in the cutoff probe system instead of the transmission spectrum. The highly accurate reactance spectrum of the plasma-cutoff probe system, as expected from previous circuit simulations [Kim et al. , Appl. Phys. Lett. 99 , 131502 (2011)], was measured using the full two-port error correction and automatic port extension methods of the network analyzer. The electron density can be obtained from the analysis of the measured reactance spectrum, based on circuit modeling. According to the circuit simulation results, the reactance cutoff probe can measure the electron density more precisely than the previous cutoff probe at low densities or at higher pressure. The obtained results for the electron density are presented and discussed for a wide range of experimental conditions, and this method is compared with previous methods (a cutoff probe using the transmission spectrum and a single Langmuir probe).
    Print ISSN: 1070-664X
    Electronic ISSN: 1089-7674
    Topics: Physics
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  • 3
    Publication Date: 2016-03-17
    Description: As collisions between electrons and neutral particles constitute one of the most representative physical phenomena in weakly ionized plasma, the electron-neutral (e-n) collision frequency is a very important plasma parameter as regards understanding the physics of this material. In this paper, we measured the e-n collision frequency in the plasma using a calibrated cutoff-probe. A highly accurate reactance spectrum of the plasma/cutoff-probe system, which is expected based on previous cutoff-probe circuit simulations [Kim et al ., Appl. Phys. Lett. 99 , 131502 (2011)], is obtained using the calibrated cutoff-probe method, and the e-n collision frequency is calculated based on the cutoff-probe circuit model together with the high-frequency conductance model. The measured e-n collision frequency (by the calibrated cutoff-probe method) is compared and analyzed with that obtained using a Langmuir probe, with the latter being calculated from the measured electron-energy distribution functions, in wide range of gas pressure.
    Print ISSN: 1070-664X
    Electronic ISSN: 1089-7674
    Topics: Physics
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  • 4
    Publication Date: 1994-04-01
    Print ISSN: 0034-6748
    Electronic ISSN: 1089-7623
    Topics: Electrical Engineering, Measurement and Control Technology , Physics
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