ISSN:
1662-9752
Source:
Scientific.Net: Materials Science & Technology / Trans Tech Publications Archiv 1984-2008
Topics:
Mechanical Engineering, Materials Science, Production Engineering, Mining and Metallurgy, Traffic Engineering, Precision Mechanics
Notes:
Embossing or imprint lithography is the key-technology for the mass production of nanosizedstructures with low cost. Currently Si or quartz template which is produced by e-beam orDUV lithography and reactive ion etching, is used. However they are very expensive and easilydamaged due to their brittleness. On the other hand, Ni template has high mechanical durability andcan be fabricated with low cost by electroplating. However, one of the key obstacles of Ni templateis poor antistiction property, when it is used with sticky thermoset polymer. Due to its poorantistiction property, detachment of Ni template from epoxy substrate is one of the key obstacles. Inthis experiment, quartz template with 150nm to 1μm sized surface protrusion was fabricated andused to emboss the PMMA coated Si wafer. Then the imprinted PMMA layer was coated withmetal seed layer and electroplating of Ni was followed to fabricate Ni template with 150nm to 1μmsized patterns. In order to form antistiction layer on Ni template, SAM antistiction layer was formedon SiO2 coated Ni template. As a result, nano patterns could be successfully transferred to stickythermoset polymer using Ni template without any degradation of antistiction property
Type of Medium:
Electronic Resource
URL:
http://www.tib-hannover.de/fulltexts/2011/0528/02/15/transtech_doi~10.4028%252Fwww.scientific.net%252FMSF.539-543.3580.pdf
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