ISSN:
1573-4803
Source:
Springer Online Journal Archives 1860-2000
Topics:
Mechanical Engineering, Materials Science, Production Engineering, Mining and Metallurgy, Traffic Engineering, Precision Mechanics
Notes:
Abstract The heat of adsorption and adsorbed amounts of H2O(vap) have been measured on an industrial crystalline Si3N4 outgassed at 400 and 800° C. A nearly uniform surface is present after the 400° C thermal treatment, where H2O is adsorbed via hydrogen bonding to surface OH and NH groups with a heat of adsorption of ≊ 50 kJ mol−1. After 800° C thermal treatment, which involves the dehydration and condensation of OH and NH groups, water is readily dissociated at the surface (−ΔH 〉 50 kJ mol−1) and the pristine surface is formed on which water is hydrogen bonded again. No hydrophobic patches are detected. The results are discussed in comparison with SiO2 behaviour in similar conditions.
Type of Medium:
Electronic Resource
URL:
http://dx.doi.org/10.1007/BF01107440
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