ISSN:
1434-6036
Keywords:
PACS. 68.35.Fx Diffusion; interface formation – 68.65-k Low-dimensional, mesoscopic, and nanoscale systems: structure and nonelectronic properties – 71.55.Jv Disordered structures; amorphous and glassy solids – 75.70.-i Magnetic properties of thin films, surfaces, and interfaces
Source:
Springer Online Journal Archives 1860-2000
Topics:
Physics
Notes:
Abstract: Comparative study of the solid-state reaction (SSR) in a series of Ti/Ni multilayered films (MLF) with a bilayer period of 0.65-22.2 nm and a constant Ti to Ni sublayer thickness ratio has been performed by using the experimental and computer-simulated magneto-optical (MO) and optical spectroscopies as well as X-ray diffraction (XRD). It was shown that alloyed-like regions in an amorphous structure is spontaneously formed near the interfaces between pure elements during the film deposition. The thickness of this region was estimated as 2-3.8 nm on the basis of the MO and optical studies. The SSR in the Ti/Ni MLF caused by an annealing at 580 K for 60 min increases the thickness of these interfacial amorphous regions. It was shown that SSR takes place mainly in the Ti/Ni MLF with relatively “thick” sublayers. The existence of a threshold nominal Ni-sublayer thickness for observing the equatorial Kerr effect of about 3.0 and 4.5 nm for the as-deposited and annealed Ti/Ni MLF, respectively, is explained by formation of the nonmagnetic alloyed regions between pure components during the film deposition as a result of the SSR. For the case of Ti/Ni MLF, the MO and optical approaches turn out to be more sensitive in determining the thickness of the reacted zone, while XRD is more useful for the structural analysis. It was also shown that the very thin nonreacted Ni sublayers have different MO properties (and hence electronic structure) from the bulk.
Type of Medium:
Electronic Resource
URL:
http://dx.doi.org/10.1140/epjb/e20020064
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